投射电容屏ITO电路检测用线阵CCD成像系统的设计

发布时间：2018-09-14 16:30

【摘要】：为解决线阵CCD用于投射电容屏氧化铟锡(ITO)电路检测时不易获取高对比度图像的问题,根据明场照明反射成像原理,设计并构建了一套基于最大叠加反射系数差值的同轴照明与成像系统.根据投射电容屏ITO电路与玻璃基板的光学特性及ITO电路的几何特征,分析了光源照射及成像方式;根据ITO电路的多层复合结构,分析了影响ITO电路与玻璃基板成像对比度的影响因素;在满足较高生产率的运动速度下,通过对比不同光照亮度下所获取的系列图像,确定了可获得高对比度ITO电路与玻璃基板图像的成像系统工作参数.实验结果表明:检测精度为10μm、ITO基板运动速度为130 mm/s且光照亮度等级为190时,所获图像的灰度直方图具有显著双峰值,易于识别ITO电路缺陷.
[Abstract]:In order to solve the problem that it is difficult to obtain high contrast image when linear CCD is used to detect indium tin oxide (ITO) circuit of projection capacitor screen, according to the principle of reflection imaging of bright field illumination, A coaxial illumination and imaging system based on the maximum superimposed reflection coefficient difference is designed and constructed. According to the optical characteristics of the ITO circuit and the glass substrate and the geometric characteristics of the ITO circuit, the illumination and imaging methods of the light source are analyzed, and according to the multilayer composite structure of the ITO circuit, The influence factors on the contrast between ITO circuit and glass substrate imaging are analyzed, and the series images obtained by comparing the different illumination luminance with the high productivity motion speed are analyzed. The working parameters of the imaging system which can obtain high contrast ITO circuit and glass substrate image are determined. The experimental results show that when the detection accuracy is 10 渭 m and the moving speed of the ITO substrate is 130 mm/s and the illumination level is 190, the gray histogram of the obtained image has significant double peaks, and it is easy to recognize the defects of the ITO circuit.
【作者单位】：华南理工大学机械与汽车工程学院;
【基金】：广东省工业高新技术攻关引导项目(2013B010402003)
【分类号】：TM24;TP391.41

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