基于前馈控制的等离子体电源恒流控制策略
发布时间：2018-12-24 14:17
【摘要】：为抑制负载扰动对恒流控制的影响,针对等离子体负载需求,提出一种基于前馈控制的等离子体电源恒流控制策略。首先根据恒流源的开环传递矩阵,探讨输出导纳对恒流电源负载扰动的影响机理,然后在分析等离子体负载模型以及电弧放电所带来的负载扰动问题的基础上,将电压前馈控制引入电流闭环中。从降低恒流控制变换器的等效导纳的角度,进行电压前馈补偿函数的设计,并分析负载模型参数对前馈补偿函数的影响,对比引入电压前馈控制前后负载扰动的噪声衰减情况。仿真和实验结果表明,基于前馈控制的等离子体电源恒流控制策略能有效抑制等离子体负载突变对恒流输出的扰动,改善了恒流控制系统的动态响应性能,并对减少溅射镀层缺陷、提高膜层质量有良好的效果。
[Abstract]:In order to restrain the influence of load disturbance on constant current control, a constant current control strategy for plasma power supply based on feedforward control is proposed to meet the demand of plasma load. Based on the open-loop transfer matrix of the constant current source, the influence mechanism of the output admittance on the load disturbance of the constant current power supply is discussed. Then, based on the analysis of the plasma load model and the load disturbance caused by the arc discharge, the influence mechanism of the output admittance on the load disturbance of the constant current power supply is discussed. The voltage feedforward control is introduced into the current closed loop. In order to reduce the equivalent admittance of the constant current control converter, the voltage feedforward compensation function is designed, and the influence of load model parameters on the feedforward compensation function is analyzed. The noise attenuation of the load disturbance before and after the introduction of voltage feedforward control is compared. The simulation and experimental results show that the constant current control strategy based on feedforward control can effectively suppress the constant current output disturbance caused by the sudden change of plasma load and improve the dynamic response performance of the constant current control system. It has a good effect on reducing the defects of sputtering coating and improving the quality of the film.
【作者单位】： 西安理工大学自动化与信息工程学院;
【基金】：国家自然科学基金青年科学基金资助项目(51307139)
【分类号】：TM46;O539
本文编号：2390735
[Abstract]:In order to restrain the influence of load disturbance on constant current control, a constant current control strategy for plasma power supply based on feedforward control is proposed to meet the demand of plasma load. Based on the open-loop transfer matrix of the constant current source, the influence mechanism of the output admittance on the load disturbance of the constant current power supply is discussed. Then, based on the analysis of the plasma load model and the load disturbance caused by the arc discharge, the influence mechanism of the output admittance on the load disturbance of the constant current power supply is discussed. The voltage feedforward control is introduced into the current closed loop. In order to reduce the equivalent admittance of the constant current control converter, the voltage feedforward compensation function is designed, and the influence of load model parameters on the feedforward compensation function is analyzed. The noise attenuation of the load disturbance before and after the introduction of voltage feedforward control is compared. The simulation and experimental results show that the constant current control strategy based on feedforward control can effectively suppress the constant current output disturbance caused by the sudden change of plasma load and improve the dynamic response performance of the constant current control system. It has a good effect on reducing the defects of sputtering coating and improving the quality of the film.
【作者单位】： 西安理工大学自动化与信息工程学院;
【基金】：国家自然科学基金青年科学基金资助项目(51307139)
【分类号】：TM46;O539
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