基于有限元和正交试验法的CVD感应加热器数值模拟及优化

发布时间：2018-01-05 05:13

本文关键词：基于有限元和正交试验法的CVD感应加热器数值模拟及优化　出处：《热加工工艺》2017年22期 　论文类型：期刊论文

【摘要】：通过有限元数值模拟软件与正交试验设计相结合的方法对CVD设备反应室的温度场进行优化。研究了激励电流、电流频率、线圈匝数、线圈间距和加热时间对沉积石墨管温度场的影响。引入平均温度、温度标准差及变异系数指标,采用5因素5水平的正交试验法来设计参数组合进行有限元模拟。通过极差分析和方差分析确定影响石墨管的温度、温度方差及变异系数指标的主次因素,确定最优值。最后对最优的感应加热参数进行模拟验证。结果表明:优化后的温度均匀性获得改善。同时,模拟次数大量减少,提高了优化效率。
[Abstract]:The temperature field of CVD equipment reaction chamber were optimized by finite element numerical simulation software and orthogonal design combination was studied. The excitation current, current frequency, the number of turns of the coil, coil spacing and the effect of heating time on the deposition of graphite tube temperature field is introduced. The average temperature, the temperature of standard deviation and coefficient of variation index, orthogonal the test method with 5 factors and 5 levels to design parameters for finite element simulation. Determined by range analysis and variance analysis of influence factors of the graphite tube temperature, temperature variance and coefficient of variation index, to determine the optimal value. Finally, the optimal parameters of induction heating was simulated. The results show that the optimized temperature uniformity get improved. At the same time, a substantial reduction in the number of simulations, the optimization efficiency is improved.

【作者单位】：武汉理工大学现代汽车零部件技术湖北省重点实验室;武汉理工大学汽车零部件技术湖北省协同创新中心;武汉理工大学材料复合新技术国家重点实验室;
【分类号】：TN304.055
【正文快照】： 碳化硅(Si C)具有优良的高温力学性能、耐腐蚀性和低膨胀系数,近年来被广泛应用于机械、电子、航空航天等各个领域。化学气相沉积法(CVD:Chemical Vapor Deposition)是制备高密度、高纯度、结合强度较好的Si C表面涂层的主要方法,可以通过调整CVD工艺参数实现对涂层组分、结

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