Silica-based microcavity fabricated by wet etching

发布时间：2018-02-24 23:17

本文关键词： whispering gallery mode wet etching quality factor　出处：《Chinese Physics B》2017年05期 　论文类型：期刊论文

【摘要】：Silica whispering gallery mode(WGM) microcavities were fabricated by the buffered oxide etcher and potassium hydroxide wet etching technique without any subsequent chemical or laser treatments. The silicon pedestal underneath was an octagonal pyramid, thus providing a pointed connection area with the top silica microdisk while weakly influencing the resonance modes. The sidewalls of our microdisks were wedge shaped, which was believed to be an advantage for the mode confinement. Efficient coupling from and to the 60 μm diameter microdisk structure was achieved using tapered optical fibres, exhibiting a quality factor of 1.5×10~4 near a wavelength of 1550 nm. Many resonance modes were observed, and double transverse electric modes were identified by theoretical calculations. The quality factor of the microdisks was also analysed to deduce the cavity roughness. The wet etching technique provides a more convenient avenue to fabricate WGM microdisks than conventional fabrication methods.
[Abstract]:Microcavities were fabricated by buffered oxide etcher and potassium hydroxide wet etching etching without without any any chemical or laser treatment s.#en21# silicon underneath was an octagonal pyramid, thus providing a pointed area area with with with area with area area with with area area with with area with area with area with area with weakly influencing influencing influencing the resonance resonance desdes.#en42# The The were were wedge shaped. which was was was to be a advantage advantage advantage for for for. Coupling from and to the 60 渭 m diameter microdisk structure was achieved using tapered optical fibres.#en12# a quality factor of 1.5 脳 104#en15# a wavelength of 1550nm. Many resonance modes were were were double double double electric were were identified by theoretical calculations. The quality factor of the the analysed to deduce the cavity roughness.#en40# wet etching etching etching #en47to fabricate WGM microdisks than conventional conventional conventional.
【作者单位】： Department
【基金】：Project supported by the Postdoctoral Science Foundation of China(Grant No.2015M582041) the Special Project on the Integration of Industry,Education and Research of Aviation Industry Corporation of China
【分类号】：TN305.7

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