多孔硅基光学梳状滤波器的技术研究

发布时间：2018-03-01 02:24

本文关键词： 多孔硅梳状滤波器折射率匹配反射率带宽　出处：《长春理工大学》2015年硕士论文　论文类型：学位论文

【摘要】：多孔硅基光子器件由于其折射率在制作过程中可通过控制腐蚀条件来改变而具有潜在应用价值。多孔硅梳状结构具有光滑的折射率分布,可以提高光学器件的性能,在近红外范围内的单个和多个带隙的梳状结构已经被广泛应用于化学和生物传感器。基于电化学腐蚀硅的机理,通过电化学阳极氧化法,在p型单晶硅上制备了近红外光谱范围(1μm-3μm)内工作的多孔硅光学梳状滤波器。为了提高滤波器的发光质量,首先对梳状多孔硅反射光谱的影响因素进行研究,在此基础上采用折射率匹配技术,在梳状多孔硅结构中引入了厚度为5.1μm的折射率匹配层,有效降低了干涉条纹和二次谐波的相对反射强度。最后通过串行连接的方式将多个梳状多孔硅叠加,制备出带宽为1350nm的宽带宽梳状滤波器,采取同样的方式将两个梳状多孔硅串行叠加,制备出双通道的多孔硅梳状滤波器。
[Abstract]:Porous silicon based photonic devices have potential application value because their refractive index can be changed by controlling corrosion conditions during fabrication. The comb structure of porous silicon has smooth refractive index distribution, which can improve the performance of optical devices. Single and multiple band gap comb structures in near infrared range have been widely used in chemical and biological sensors. Based on the mechanism of electrochemical corrosion of silicon, electrochemical anodic oxidation method is used. Porous silicon optical comb filters operating in the near infrared spectrum range of 1 渭 m -3 渭 m have been fabricated on p-type monocrystalline silicon. In order to improve the luminescence quality of the filter, the factors affecting the reflection spectrum of comb porous silicon have been studied. On the basis of this, the refractive index matching layer of 5.1 渭 m thickness is introduced into the comb porous silicon structure by using refractive index matching technique. The relative reflection intensity of interference fringes and second harmonics is reduced effectively. Finally, a wide band comb filter with a bandwidth of 1350nm is fabricated by superposing a plurality of comb porous silicon by serial connection. In the same way, two comb porous silicon filters are prepared by serial superposition of two comb porous silicon.
【学位授予单位】：长春理工大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN713

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