动态气流下真空腔室内的压强分布及压差测量

发布时间：2018-03-04 16:15

本文选题：真空腔室　切入点：压强测量　出处：《真空科学与技术学报》2016年02期 　论文类型：期刊论文

【摘要】：集成电路(IC)装备工艺腔室内流场的均匀性是影响镀膜质量的关键因素。本文通过控制真空腔室入口处N_2流量(140,230,320 mL/min(标准状态))和出气口处压强值(36,45,55 Pa)来设置实验,采用压力管法测量低压腔室内任一点的压强值和薄膜规直接测量腔壁、出气口的压强值来实现腔室内压强分布的研究和压差的测量。讨论了腔壁与出气口之间的压差对压力管法的测量误差的影响;选择了二级匀气装置对进入腔室内的气体进行布气,通过比较腔室内同一水平面上各点与出气口之间的压差是否恒定来分析二级匀气盘的匀气效果。试验研究发现:在距离腔室中心150 mm的范围内,二级匀气装置的布气效果明显;本文采用的压力管法测量腔室内压强的误差与腔室进气量和腔室内流速存在内在联系。研究结果对IC装备设计及工艺控制有一定的指导意义。
[Abstract]:The uniformity of flow field in the process chamber of integrated circuit (IC) equipment is the key factor that affects the quality of the coating. The experiment is carried out by controlling the flow rate of N2 at the entrance of the vacuum chamber and the pressure at the outlet of the vacuum chamber by controlling the flow rate of N2 at the entrance of the vacuum chamber and by controlling the flow rate of 320 mL / min (standard state) and the pressure at the outlet of the air outlet. Pressure tube method is used to measure the pressure at any point in the chamber and the film gauge is used to measure the wall of the cavity directly. The pressure value of the outlet is used to study the pressure distribution and the measurement of the pressure difference in the chamber. The influence of the pressure difference between the cavity wall and the outlet on the measurement error of the pressure tube method is discussed. A two-stage uniform gas device is selected to distribute the gas entering the chamber. By comparing whether the pressure difference between the points on the same horizontal plane and the outlet of the chamber is constant or not, this paper analyzes the gas uniformity effect of the two-stage uniform gas disk. The experimental study shows that the gas distribution effect of the two-stage uniform gas device is obvious in the range of 150 mm from the center of the chamber; The pressure tube method used in this paper is used to measure the pressure error of the chamber, which is related to the air intake and the flow velocity of the chamber. The research results have some guiding significance for IC equipment design and process control.
【作者单位】：五邑大学机电工程学院;江门市CAD/CAM工程技术研发中心;
【基金】：国家科技重大专项资助项目(No.2011ZX02403-004)
【分类号】：TN407

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