数字无掩膜光刻技术及其大面积曝光方案研究

发布时间：2018-03-06 05:23

本文选题：光刻技术　切入点：数字微反射镜　出处：《西安电子科技大学》2015年硕士论文　论文类型：学位论文

【摘要】：光刻技术是集成电路制造、印刷电路板制造以及微机电元件制造等微纳加工领域的核心技术之一。进入21世纪以来,随着我国电子信息产业的高速发展,集成电路的需求出现了井喷式的增长。由于我国光刻技术研究起步较晚,生产技术水平及规模远远满足不了国内的消费需求,大量的集成电路依赖进口来支撑,这已经对国家信息安全、国防安全的建设构成了强大的威胁。在传统的光刻技术领域,国外的技术积累和专利保护措施严格限制了国内相关技术的发展,使得短期内我国很难在该领域获得突破性的进展。微光机电系统自出现以来一直受到广泛的关注,并被当作数字空间光调制器应用于光刻领域。数字空间光调制器作为光刻系统中的图形发生器,其能够取代传统光学光刻中的掩膜版,具有灵活、便捷、成本低以及生产效率高等特点,在微光学元器件生产、集成电路及PCB制造行业表现出了极其广阔的应用前景。相比于电子束光刻、离子束光刻、紫外光刻等光刻技术,数字无掩膜光刻作为新兴的无掩膜光刻技术,具有制造门槛低、技术壁垒少等优势,该技术为我国突破国外光刻技术垄断和发展具有自主知识产权的光刻技术带来了新的契机。虽然基于数字空间光调制器的无掩膜光刻技术具有灵活性高、成本低、效率高等优点,但是系统中通常存在数据处理速度低以及大面积光刻对接困难等问题。因此本文以数字无掩膜光刻系统为研究方向,对系统设计中涉及的关键技术进行分析,并针对光刻系统中存在大面积曝光问题提出了新的解决方案。本文首先对光刻技术做了全面的介绍,包括应用背景、技术流程以及各种光刻技术的方法原理和优缺点。然后,对数字无掩膜光刻系统中的关键元器件“数字光调制器”的结构特点、电气特性以及灰度调制的实现原理进行了详细的介绍。接着对数字无掩膜光刻系统中光源选择、均光处理方案及投影物镜的设计进行了研究,并针对数字光刻系统中经常出现的图像处理速度慢及数据传输效率低的问题,结合GPU及DMA技术,提出一种高效图像传输及高速图像处理的架构,且在本地搭建CUDA开发环境,利用光刻图像处理中常用的角点检测算法对系统的数据处理性能进行验证。最后,针对数字无掩膜光刻设备中大面积曝光问题进行深入的分析,在研究基于灰度的步进拼接算法的基础上,提出了一种扫描投影方法,该方法能够有效解决基于灰度的步进拼接算法中存在的曝光图像刷新速度慢、生产效率低以及容易引入定位误差等问题。通过仿真验证该方法拼接效果良好,能够有效降低曝光拼接的对位误差。
[Abstract]:Photolithography is one of the core technologies in the fields of integrated circuit, printed circuit board and micro electromechanical components. Since 21th century, with the rapid development of electronic information industry in China, The demand for integrated circuits has increased by blowout. Since the research of lithography technology in China started relatively late, the level and scale of production technology can not meet the domestic consumer demand, and a large number of integrated circuits depend on imports to support them. This has posed a strong threat to the construction of national information security and national defense security. In the field of traditional lithography technology, technology accumulation and patent protection measures abroad have severely restricted the development of relevant domestic technologies. It is very difficult for our country to make a breakthrough in this field in the short term. As a graphic generator in lithography system, digital spatial light modulator can replace mask plate in traditional optical lithography, so it is flexible and convenient. Because of its low cost and high production efficiency, it has been widely used in the production of microoptical components, integrated circuits and PCB. Compared with electron beam lithography, ion beam lithography, ultraviolet lithography and other lithography technologies, As a new non-mask lithography technology, digital non-mask lithography has the advantages of low manufacturing threshold and low technical barriers. This technology brings a new opportunity for our country to break through the monopoly of foreign lithography technology and to develop lithography technology with independent intellectual property rights, although the non-mask lithography technology based on digital spatial light modulator has high flexibility and low cost. The efficiency is high, but there are some problems in the system, such as low data processing speed and difficult docking of large area lithography. Therefore, the key technologies involved in the system design are analyzed in this paper. A new solution to the problem of large area exposure in lithography system is put forward. Firstly, this paper gives a comprehensive introduction to lithography technology, including the application background, technical flow, method principle, advantages and disadvantages of various lithography technologies. This paper introduces in detail the structure characteristics, electrical characteristics and the realization principle of gray level modulation of the key component of digital maskless lithography system, which is the digital optical modulator. Then, the selection of light source in the digital mask free lithography system is introduced in detail. The scheme of equalizing light processing and the design of projection objective lens are studied. Aiming at the problems of slow image processing speed and low efficiency of data transmission in digital lithography system, combined with GPU and DMA technology, An efficient image transmission and high speed image processing architecture is proposed, and a local CUDA development environment is set up. The data processing performance of the system is verified by the corner detection algorithm commonly used in lithography image processing. Aiming at the problem of large area exposure in digital mask free lithography equipment, a scanning projection method is proposed on the basis of studying the algorithm of step stitching based on gray level. This method can effectively solve the problems of slow refresh speed of exposure image, low production efficiency and easy introduction of positioning error in the grayscale based step stitching algorithm. It can effectively reduce the alignment error of exposure splicing.
【学位授予单位】：西安电子科技大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN305.7

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