用于光刻成像的DMD图像曝光方法研究与实现

发布时间：2018-03-28 14:20

本文选题：DMD　切入点：数字无掩模光刻　出处：《电子科技大学》2017年硕士论文

【摘要】：光刻技术是半导体行业的基础。随着集成电路器件特征尺寸的不断减小,传统光刻工艺中所需要的掩模版制作成本急剧增加,各类无掩模光刻技术在近年来得到快速发展。基于DMD(Digital Micromirror Device)的数字无掩模光刻使用DMD代替传统光刻掩模版,降低了掩模制作的难度和高昂成本,简化了传统光刻加工的流程,具有效率高、成本低、灵活等优点。通过计算机灵活控制DMD曝光图像进行灰度曝光,可方便实现连续复杂微结构的加工,在3D光刻领域具有传统光刻技术无可比拟的优势,在半导体集成电路、PCB制造、微光学元件加工等行业具有非常好的应用前景。本文围绕DMD数字光刻系统,针对大面积光刻加工中的曝光方式、曝光效率及灰度曝光等问题,提出新的解决方案。首先,研究大面积光刻加工的DMD曝光方式,针对现有DMD数字光刻系统在扫描曝光工作方式下存在的效率低的问题,设计一种DMD高速图像曝光方法,优化扫描曝光的处理流程。通过预存所有图像数据,并在FPGA中完成对曝光图像的处理及对DMD曝光控制方式的优化,实现大面积光刻图像的高速扫描曝光。然后,根据DMD的灰度调制方式,研究使用DMD进行灰度图像曝光的控制算法,改进基于二元脉冲宽度调制的DMD灰度帧频提高方案,并设计一种面向扫描式3D光刻的DMD灰度图像曝光方法,通过软件对灰度图像进行位平面分解,在FPGA中完成对灰度曝光图像的处理和对DMD的灰度调制,实现DMD灰度光刻曝光,并获得较高的灰度帧频。最后在TI DLP4100开发平台中,基于FPGA设计并实现了DMD高速图像曝光方法和灰度图像曝光方法。通过发挥FPGA的高速数据传输和强大的时序控制能力的优势,最大限度利用DMD图像翻转的速度,实现一个高性能的DMD扫描曝光控制器,并应用到实际数字光刻机的开发中。实验结果表明,本文设计的DMD图像曝光方法有效地提高了DMD数字光刻系统的扫描曝光和灰度曝光的速度及工作效率。
[Abstract]:Photolithography technology is the foundation of semiconductor industry. With the decreasing of feature size of integrated circuit devices, the cost of mask fabrication required in traditional lithography technology increases dramatically. In recent years, various kinds of unmask lithography technology have been developed rapidly. Digital mask lithography based on DMD(Digital Micromirror device uses DMD instead of traditional lithography mask plate, which reduces the difficulty and high cost of mask fabrication and simplifies the process of traditional lithography processing. It has the advantages of high efficiency, low cost, flexibility and so on. By controlling DMD exposure image flexibly by computer, the processing of continuous and complex microstructures can be realized conveniently, which has the unparalleled advantage of traditional lithography technology in the field of 3D lithography. This paper focuses on the DMD digital lithography system, aiming at the problems of exposure mode, exposure efficiency and gray exposure in large area lithography. A new solution is proposed. Firstly, the DMD exposure mode of large area lithography is studied. Aiming at the low efficiency of the existing DMD digital lithography system in scanning exposure mode, a high speed DMD image exposure method is designed. The processing flow of scanning exposure is optimized. By storing all image data in advance, processing the exposed image in FPGA and optimizing the exposure control mode of DMD, the high-speed scanning exposure of large area lithography image is realized. According to the gray level modulation of DMD, the control algorithm of gray image exposure using DMD is studied, and the scheme of improving the frame frequency of DMD based on binary pulse width modulation is improved, and a DMD gray image exposure method oriented to scanning 3D lithography is designed. The software is used to decompose the grayscale image into bit-plane, to process the grayscale exposure image and to modulate the gray level of DMD in FPGA, to realize the DMD grayscale lithography exposure, and to obtain the higher gray frame frequency. Finally, in the TI DLP4100 development platform, the grayscale lithography is realized. Based on FPGA, DMD high speed image exposure method and gray image exposure method are designed and implemented. By taking advantage of FPGA's high speed data transmission and powerful timing control ability, the maximum speed of DMD image flipping is utilized. A high performance DMD scanning exposure controller is implemented and applied to the development of a digital lithography machine. The experimental results show that, The DMD image exposure method designed in this paper can effectively improve the speed and efficiency of scanning exposure and gray exposure of DMD digital lithography system.
【学位授予单位】：电子科技大学
【学位级别】：硕士
【学位授予年份】：2017
【分类号】：TN305.7;TP391.41

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