浸没式光刻微环境气体参数控制及制备系统研制

发布时间：2018-04-22 20:19

本文选题：浸没式光刻 + 洁净度　；参考：《浙江大学》2017年硕士论文

【摘要】：浸没式光刻中提高光刻分辨率的方法是在物镜系统中的最后一片投影物镜和硅片之间填充高折射率的浸没液体。本课题从浸没式光刻中浸没液体的气密封需求出发,研制出浸没式光刻微环境气体参数控制及制备系统,为浸没液体提供指标满足要求的密封气体,维持浸没流场的稳定。在浸没式光刻中需对普通压缩空气中的洁净度、NH_3和SO_2浓度、流量、压力、湿度等指标进行控制以满足微环境气体要求,研制出指标满足要求的密封气体具有重要意义。本课题以浸没式光刻微环境气体参数控制及制备系统为研究对象,主要研究工作如下:1、完成工艺原理与机械布局方案设计。对系统的指标进行分析,完成污染物控制方案、流量控制方案、压力控制方案和湿度控制方案的设计。在污染物控制方案中包括洁净度控制方案和NH_3、SO_2浓度控制方案。在湿度控制方案中,设计出适用于管道小流量的气体加湿器,包括超声波加湿器和浴水加湿器。分析四类控制方案的顺序,完成指标的控制顺序方案设计,最后得到系统的工艺原理总图;根据工艺原理方案,完成机械布局方案的设计。2、完成电控系统设计。为了实现系统的自动运行功能,完成电控系统的设计,包括分析电控系统中元器件的信号类型和数量、PLC的CPU和扩展模块的类型和数量、电气原理图的设计以及电控元件的布线设计,完成系统控制流程设计与PLC程序设计。3、完成湿空气流量控制方法研究。通过分析湿空气的流量控制要求,采用模糊PID控制,搭建MATLAB/SIMULINK的模糊PID控制仿真图,以仿真数据为依据进行实验,得到良好的气体流量控制要求。
[Abstract]:In immersion lithography, the method to improve the resolution of lithography is to fill a high refractive index immersion liquid between the last projection objective lens and the silicon wafer in the objective lens system. Based on the gas seal requirement of immersed liquid in immersion lithography, a gas parameter control and preparation system in immersion lithography is developed in this paper. The system can provide the seal gas which can satisfy the requirement of immersion liquid, and maintain the stability of immersion flow field. In immersion lithography, it is important to control the cleanliness of compressed air such as concentration of NH3 and SO_2, flow rate, pressure, humidity and so on in order to meet the requirements of micro-environmental gas. It is of great significance to develop a sealed gas that meets the requirements. In this paper, the control and preparation system of gas parameters in immersion lithography environment is taken as the research object. The main research work is as follows: 1. The design of process principle and mechanical layout scheme is completed. The design of pollutant control scheme, flow control scheme, pressure control scheme and humidity control scheme are completed by analyzing the index of the system. The pollution control scheme includes cleanliness control scheme and NH _ 3 / S _ 2 concentration control scheme. In the humidity control scheme, a gas humidifier, including ultrasonic humidifier and bath water humidifier, is designed. This paper analyzes the sequence of four kinds of control schemes, completes the design of the control sequence scheme of the index, and finally obtains the general plan of the system's process principle, and completes the design of the mechanical layout scheme. 2, and completes the design of the electronic control system according to the scheme of the process principle. In order to realize the automatic running function of the system, the design of the electronic control system is completed, including the analysis of the signal type and quantity of the components in the electronic control system and the type and quantity of the CPU and the expansion module. The design of the electrical schematic diagram and the wiring design of the electronic control element, the design of the system control flow and the design of the PLC program. 3, and the research of the wet air flow control method. Through analyzing the requirement of wet air flow control, fuzzy PID control is adopted, and the simulation diagram of fuzzy PID control of MATLAB/SIMULINK is built. According to the simulation data, the good gas flow control requirements are obtained.
【学位授予单位】：浙江大学
【学位级别】：硕士
【学位授予年份】：2017
【分类号】：TP273;TN405

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