亚像素扫描调制系统参数优化研究

发布时间：2018-04-23 04:11

本文选题：微光学元件 + DMD　；参考：《南昌航空大学》2017年硕士论文

【摘要】：微光学元件目前在光信息处理、光通信、微光学传感器,超精细加工等许多光学领域方面获得了越来越广泛地应用。微结构光学器件正向微型化、阵列化等方向发展,器件的尺寸要求变得越来越小,相应地使得制作微光学元件的方法要求越来越高。鉴于制作微光学元件技术需要克服光刻技术效率不高,提高分辨率等研究问题,提出了一种基于DMD数字掩模制作技术制作微光学元件的新方法。本文通过对基于DMD数字掩模制作技术理论研究,通过实验仿真对倾斜角度theta和扫描步长等实验参数的匹配优化研究,实现了改善分辨率的可行性,并且探究二者误差对成像质量的影响,为探索微光学元件的制作方法提供一条新的途径。论文的主要研究工作如下:1、详细研究了亚像素扫描调制光刻技术的原理,以及单方向扫描调制数字掩模提高分辨率的机理。分别设计了几种优化的数字掩模,包括二元光栅掩模、微透镜掩模和微透镜阵列掩模,通过仿真上述掩模沿不同倾斜角单方向移动积累的曝光量来验证亚像素扫描调制光刻技术,从而改善光刻成像质量的可行性。2、搭建了亚像素扫描调制光刻系统,详细介绍了各个光学部件在整个光路系统中所起的作用以及光路调整方法,并对光刻系统中的光源参数、扫描参数等做了一定的优化。通过仿真实验得出了最优扫描参数的匹配,即扫描步长和倾斜角度之间的优化匹配。3、通过大量的实验研究,深入摸索了实验工艺,探究了不同参数以及不同的实验条件对制作结果的影响,获得了较好的实验工艺参数。
[Abstract]:At present, microoptical elements have been widely used in many optical fields, such as optical information processing, optical communication, micro-optical sensors, hyperfine processing and so on. With the development of microstructural optical devices in the direction of miniaturization and arraying, the size requirement of the devices becomes smaller and smaller, which makes the method of fabricating micro-optical elements more and more demanding. In view of the low efficiency of photolithography and the improvement of resolution, a new method based on DMD digital mask fabrication technology is proposed to fabricate microoptical elements. In this paper, the feasibility of improving the resolution is realized by studying the theory of digital mask fabrication based on DMD and the matching and optimization of experimental parameters such as tilt angle theta and scanning step size by experimental simulation. It also provides a new way to explore the fabrication method of microoptical elements by exploring the effect of the errors on the imaging quality. The main work of this paper is as follows: 1. The principle of sub-pixel scanning modulation lithography and the mechanism of single-direction scanning modulation digital mask to improve the resolution are studied in detail. Several optimized digital masks are designed, including binary grating mask, microlens mask and microlens array mask. By simulating the exposure accumulated by the mask moving in one direction with different tilt angles, the sub-pixel scanning modulation lithography technology is verified, and the feasibility of improving the lithography quality is improved. A sub-pixel scanning modulation lithography system is built. The function of each optical component in the whole optical circuit system and the method of adjusting the optical path are introduced in detail. The parameters of the light source and scanning parameters in the lithography system are optimized to a certain extent. Through simulation experiments, the optimal matching of scanning parameters is obtained, that is, the optimal matching between scan step size and tilt angle. Through a lot of experimental research, the experiment technology is deeply explored. The effects of different parameters and different experimental conditions on the production results were investigated, and better experimental technological parameters were obtained.
【学位授予单位】：南昌航空大学
【学位级别】：硕士
【学位授予年份】：2017
【分类号】：TN405

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