光刻机微动测量系统数据处理方法研究

发布时间：2018-06-17 01:10

本文选题：光刻机 + 微动测量　；参考：《哈尔滨工业大学》2015年硕士论文

【摘要】：光刻机是IC芯片制造业中主要使用的精密设备,而在光刻机系统中,光刻机微动测量系统是其中的一个关键子系统,因为其测量理论和方案较好的证实了光刻机系统的所有特性,例如:超高精度、很强的实时性等等,另外,由光刻机的结构可知,其测量系统是一个六自由度并且大量程的系统。因此,对光刻机微动测量系统的研究是整个光刻机系统的重要课题。本论文基本完成以下几点:光刻机掩模台的整体结构、微动测量系统的传感器布局(包括双频激光干涉仪布局和霍尔传感器布局)、微动测量系统的建模分析、微动测量系统的误差来源及分析(外界误差分析和自身误差分析)、测量系统模型的解算和误差补偿前后的仿真、激光干涉仪零位校准和微动测量系统的实验验证等等。首先,分析了光刻机系统的指标要求和实时性要求,这为传感器的布局提供技术前提。根据华中科技大学团队的传统激光干涉仪布局和本系统对Z向精度的要求,设计出了利用激光干涉仪测量Z向位置的传感器布局,提高了Z向的测量精度。其次,在对测量系统进行建模时,充分考虑到控制的要求,运用了向量和坐标的方式来进行推导,而且机械上的各种误差和六自由度的耦合都充分考虑到,所以,此建模方案应为微动测量系统的完整建模。再次,针对微动测量系统,对传感器带来的误差进行详细的分析和推导。针对激光干涉仪自身的误差和外界条件引起的误差,给出了其误差补偿的方案。而在针对光刻机掩模台微动台的测量要求所需要的快速的计算和存储能力时,分别对光刻机掩模台中某一单个自由度和整体的六个自由度测量系统进行数据解算。然后分析解算前后对系统精度造成的影响,论证解算方案的可行性。最后,由激光干涉仪其测量原理可知,初始化和零位校准是其正常工作的先决条件。所以,本文对激光干涉仪的零位校准进行分析(建模和校准流程分析)。最后,在光刻机实际系统中对单自由度测量系统和六自由度测量系统进行误差补偿前后的实验验证。
[Abstract]:Lithography machine is the main precision equipment used in IC chip manufacturing, and in the system of lithography machine, the micro-motion measurement system of lithography machine is one of the key subsystems. Because its measurement theory and scheme well confirmed all the characteristics of the lithography system, such as ultra-high precision, strong real-time and so on. In addition, the structure of the lithography machine can be seen. The measurement system is a six-degree of freedom and a large range system. Therefore, the research on the fretting measurement system of lithography machine is an important subject of the whole lithography system. The main contents of this paper are as follows: the whole structure of lithography mask table, sensor layout of micro-motion measurement system (including dual-frequency laser interferometer layout and Hall sensor layout, modeling and analysis of fretting measurement system, etc.) Error source and analysis of fretting measurement system (external error analysis and self-error analysis, calculation of measurement system model and simulation before and after error compensation, zero calibration of laser interferometer and experimental verification of fretting measurement system, etc. Firstly, the index and real-time requirements of the lithography system are analyzed, which provides the technical premise for the sensor layout. According to the traditional laser interferometer layout of Huazhong University of Science and Technology and the requirement of Z direction precision of this system, the sensor layout of measuring Z direction position with laser interferometer is designed, which improves the Z direction measurement precision. Secondly, when modeling the measurement system, the control requirements are fully taken into account, the vector and coordinate are used to deduce, and all kinds of mechanical errors and the coupling of six degrees of freedom are fully taken into account, so, This modeling scheme should be integrated modeling of fretting measurement system. Thirdly, the error caused by the sensor is analyzed and deduced in detail for the fretting measurement system. Aiming at the error of laser interferometer and the error caused by external conditions, the scheme of error compensation is given. In view of the fast calculation and storage ability required for the measurement of the lithographic mask table, the data of a single degree of freedom and a whole six degree of freedom measurement system are calculated respectively. Then, the influence on the system precision before and after the solution is analyzed, and the feasibility of the solution is demonstrated. Finally, according to the measurement principle of laser interferometer, initialization and zero calibration are prerequisites for normal operation. Therefore, the zero calibration of laser interferometer is analyzed (modeling and calibration flow analysis). Finally, the error compensation of the single degree of freedom measurement system and the six degree of freedom measurement system is verified in the actual system of lithography machine.
【学位授予单位】：哈尔滨工业大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN305.7

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