极紫外光刻动态气体锁抑制率的实验研究

发布时间：2018-06-29 19:34

本文选题：光学制造 + X射线光学　；参考：《光学学报》2017年02期

【摘要】：开展了动态气体锁抑制率的实验研究,设计了一套极紫外真空动态气体锁实验验证系统;进行了真空抽气系统的详细设计,形成了具有实际可操作性的真空系统的最终布局;指出了该实验验证系统的验证方法;进行了动态气体锁实验,并对实验结果进行了分析,验证了动态气体锁理论模型和仿真结果的正确性。实验研究结果表明,当污染气体放气率恒定时,增加清洁气体总流量将使动态气体锁抑制率逐步增加;同等条件下动态气体锁抑制率不随污染气体放气率的改变而改变;当清洁气体总流量和污染气体放气率都恒定时,动态气体锁抑制率随清洁气体相对分子质量的增加而缓慢增加。该动态气体锁抑制率实验研究结果,能够为极紫外光刻机动态气体锁的研制提供实验依据。
[Abstract]:The experimental study of dynamic gas lock inhibition rate is carried out, a set of ultra-ultraviolet vacuum dynamic gas lock experimental verification system is designed, the vacuum extraction system is designed in detail, and the final layout of the vacuum system with practical maneuverability is formed. The verification method of the experimental verification system is pointed out, and the dynamic gas lock experiment is carried out, and the experimental results are analyzed to verify the correctness of the theoretical model and the simulation results of the dynamic gas lock. The experimental results show that when the discharge rate of polluted gas is constant, the inhibition rate of dynamic gas lock will increase gradually by increasing the total flow rate of clean gas, but the inhibition rate of dynamic gas lock will not change with the change of discharge rate of polluted gas under the same conditions. The inhibition rate of dynamic gas lock increases slowly with the increase of the relative molecular weight of clean gas when the total flow rate of clean gas and the discharge rate of polluted gas are both constant. The experimental results can provide experimental basis for the development of dynamic gas lock of extreme ultraviolet lithography machine.
【作者单位】：中国科学院光电研究院;北京市准分子激光工程技术研究中心;
【基金】：国家科技重大专项(2012ZX02702007)
【分类号】：TN305.7

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