双Bowtie纳米光刻结构的聚焦特性研究

发布时间：2018-07-06 07:08

本文选题：Bowtie孔径结构 + 纳米直写光刻　；参考：《光电工程》2017年02期

【摘要】：Bowtie孔径结构已被广泛用于纳米直写光刻领域来获得超衍射聚焦光斑。然而,利用该结构获得的超衍射聚焦光斑呈椭圆形,影响了Bowtie结构的进一步应用。为了获得超衍射且圆形对称的聚焦光斑,本文提出了双Bowtie新型纳米光刻结构并利用Comsol软件仿真模拟了该结构的焦斑对称特性和电场增强特性。结果表明利用双Bowtie结构获得了圆形对称焦斑,并且出射面的电场强度得到了增强,是入射面电场强度的22倍。本文进一步将双Bowtie结构与金属/介质/金属结构相结合,使得局域增强后的透射光的传输距离(工作距)得到了显著延长。
[Abstract]:Bowtie aperture structure has been widely used in nanocrystalline direct lithography to obtain superdiffractive focusing spot. However, the superdiffractive focusing spot obtained by this structure is elliptical, which affects the further application of Bowtie structure. In order to obtain superdiffractive and circular symmetrical focusing spot, a novel double Bowtie nanocrystalline photolithography structure is proposed in this paper. The focal spot symmetry and electric field enhancement characteristics of the structure are simulated by Comsol software. The results show that the circular symmetrical focal spot is obtained by using the double Bowtie structure, and the electric field intensity of the ejection surface is enhanced, which is 22 times of that of the incident plane. By combining the double Bowtie structure with the metal / dielectric / metal structure, the transmission distance (working distance) of the locally enhanced transmitted light is significantly prolonged.
【作者单位】：四川师范大学物理与电子工程学院;电子科技大学光电信息学院;
【基金】：四川省教育厅重点项目(16ZA0047)
【分类号】：TN305.7;O436

【相似文献】