基于数字掩模技术聚合物二元相位光栅的制作
发布时间：2018-08-06 14:30
【摘要】：聚合物材料具有质量轻,化学合成简便且成本低廉的特点,与硅基等无机材料相比,具有较高的电光耦合系数、热光耦合系数以及较低的介电常数,另其制作工艺不仅大规模集成电路的制作工艺兼容,且加工温度更低,因此,关于使用光学聚合物材料设计、制作微光学元件,以及应用聚合物微光学元件等方面研究工作也越来越多。本文首先对聚合物微光学元件的应用发展趋势进行了说明,然后对目前国内外使用光学聚合物材料制作微光学元件的技术进行了综述。针对光敏聚合物其折射率会随着曝光剂量变化的特点,并结合数字掩模光刻技术能对曝光剂量灵活调节,发现数字掩模光刻技术在制作聚合物微光学元件是具有优势的。本文随后对数字掩模光刻系统的结构、工作原理、光路、掩模生成系统等进行了详细介绍。利用光敏聚合物光学材料因与其敏感波长相互作用吸收能量其折射率发生变化这一特点,选用商业光敏聚合物SU-8作为加工材料,通过设计计算机数字掩模来控制曝光剂量,研究了SU-8的临界曝光剂量和曝光深度,以作为制作聚合物微光学元件的依据。然后以聚合物二元相位光栅为例,本文详细给出了基于精缩投影数字掩模光刻系统制作聚合物二元相位光栅的工艺流程并对制作样品进行表征。使用数字掩模对曝光剂量进行调节,在聚合物薄膜中形成期望折射率分布,从而制作出二元相位光栅。应用数字掩模技术制作光敏聚合物相位光栅掩模制作成本低、效率高、操作灵活,且制作工程中无需显影、刻蚀等工艺,避免了物理和化学腐蚀以及高温过程中对器件造成损伤,工艺得到了大大简化。本文也对聚合物二元相位光栅样品的衍射性质进行了实验验证。衍射实验结果表明,通过控制数字掩模的曝光时间,就可以直接改变光敏光学聚合物的折射率和折射率分布。因此,通过调节曝光剂量,数字掩模光刻技术在使用光敏聚合物制作微光学元件是可行的。
[Abstract]:The polymer has the advantages of light weight, simple chemical synthesis and low cost. Compared with inorganic materials such as silicon, the polymer has higher electro-optic coupling coefficient, thermo-optical coupling coefficient and lower dielectric constant. In addition, its fabrication process is not only compatible with the fabrication process of LSI, but also at a lower processing temperature. Therefore, with regard to the design and fabrication of microoptical elements using optical polymer materials, And the application of polymer micro-optical elements and other aspects of research work is also increasing. In this paper, the development trend of polymer microoptical elements is introduced, and then the technology of using polymer materials to fabricate microoptical elements at home and abroad is reviewed. In view of the fact that the refractive index of Guang Min polymer varies with the exposure dose and the digital mask lithography can flexibly adjust the exposure dose, it is found that the digital mask lithography has advantages in the fabrication of polymer microoptical elements. Then, the structure, working principle, optical path and mask generation system of digital mask lithography system are introduced in detail. Based on the change of refractive index of Guang Min polymer optical material due to its interaction with sensitive wavelength, commercial Guang Min polymer SU-8 is selected as processing material, and the exposure dose is controlled by designing computer digital mask. The critical exposure dose and exposure depth of SU-8 were studied as the basis for fabrication of polymer microoptical elements. Then, taking polymer binary phase grating as an example, the fabrication process of polymer binary phase grating based on condensed projection digital mask lithography system is presented in detail and the fabrication samples are characterized. A binary phase grating is fabricated by adjusting the exposure dose and forming the desired refractive index distribution in the polymer film. Using digital mask technology to fabricate Guang Min polymer phase grating mask has the advantages of low cost, high efficiency, flexible operation and no need for development and etching. Physical and chemical corrosion and damage to the device during high temperature are avoided, and the process is greatly simplified. The diffraction properties of polymer binary phase grating samples are also verified experimentally. The diffraction results show that the refractive index and refractive index distribution of Guang Min optical polymer can be directly changed by controlling the exposure time of digital mask. Therefore, by adjusting the exposure dose, digital mask lithography is feasible in the fabrication of microoptical elements using Guang Min polymers.
【学位授予单位】：南昌航空大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN305.7
本文编号：2168029
[Abstract]:The polymer has the advantages of light weight, simple chemical synthesis and low cost. Compared with inorganic materials such as silicon, the polymer has higher electro-optic coupling coefficient, thermo-optical coupling coefficient and lower dielectric constant. In addition, its fabrication process is not only compatible with the fabrication process of LSI, but also at a lower processing temperature. Therefore, with regard to the design and fabrication of microoptical elements using optical polymer materials, And the application of polymer micro-optical elements and other aspects of research work is also increasing. In this paper, the development trend of polymer microoptical elements is introduced, and then the technology of using polymer materials to fabricate microoptical elements at home and abroad is reviewed. In view of the fact that the refractive index of Guang Min polymer varies with the exposure dose and the digital mask lithography can flexibly adjust the exposure dose, it is found that the digital mask lithography has advantages in the fabrication of polymer microoptical elements. Then, the structure, working principle, optical path and mask generation system of digital mask lithography system are introduced in detail. Based on the change of refractive index of Guang Min polymer optical material due to its interaction with sensitive wavelength, commercial Guang Min polymer SU-8 is selected as processing material, and the exposure dose is controlled by designing computer digital mask. The critical exposure dose and exposure depth of SU-8 were studied as the basis for fabrication of polymer microoptical elements. Then, taking polymer binary phase grating as an example, the fabrication process of polymer binary phase grating based on condensed projection digital mask lithography system is presented in detail and the fabrication samples are characterized. A binary phase grating is fabricated by adjusting the exposure dose and forming the desired refractive index distribution in the polymer film. Using digital mask technology to fabricate Guang Min polymer phase grating mask has the advantages of low cost, high efficiency, flexible operation and no need for development and etching. Physical and chemical corrosion and damage to the device during high temperature are avoided, and the process is greatly simplified. The diffraction properties of polymer binary phase grating samples are also verified experimentally. The diffraction results show that the refractive index and refractive index distribution of Guang Min optical polymer can be directly changed by controlling the exposure time of digital mask. Therefore, by adjusting the exposure dose, digital mask lithography is feasible in the fabrication of microoptical elements using Guang Min polymers.
【学位授予单位】：南昌航空大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN305.7
【参考文献】
相关期刊论文 前1条
1 田扬超;深度紫外光刻图形精度模拟研究[J];安徽师范大学学报(自然科学版);2005年03期
，本文编号：2168029
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