一种新型高发射氧化物阴极的研制
发布时间：2018-08-18 19:06
【摘要】：本文利用等离子喷涂技术,并在镍过渡层和涂层中加入少量的钪,研制出了一种新型的高发射氧化物阴极。结果显示这种新型阴极在850℃,1μs脉宽时,其发射电流密度可达107.8 A/cm~2;新型氧化物阴极电子发射密度大而且均匀,逸出功分布在1.52-1.58eV之间占到80%。
[Abstract]:In this paper, a new type of high emission oxide cathode has been developed by plasma spraying and adding a small amount of scandium into the nickel transition layer and coating. The results show that the emission current density of the new cathode can reach 107.8 A / cm ~ (-2) at 1 渭 s pulse width at 850 鈩，
本文编号：2190396
[Abstract]:In this paper, a new type of high emission oxide cathode has been developed by plasma spraying and adding a small amount of scandium into the nickel transition layer and coating. The results show that the emission current density of the new cathode can reach 107.8 A / cm ~ (-2) at 1 渭 s pulse width at 850 鈩，
本文编号：2190396
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