Origin软件在“电容-电压法测半导体杂质浓度分布”实验中的应用
发布时间：2018-10-20 17:30
【摘要】：基于电容-电压法(简称C-V法)来测量半导体杂质浓度分布,简单快速且不破坏样品。为更快速、精确求得半导体杂质浓度分布,利用Origin软件绘出样品的C-V曲线、1/C~2-V曲线的线性拟合,快速求出杂质浓度、自建场及绘制相应的杂质浓度分布曲线。
[Abstract]:Based on the capacitance-voltage method (C-V method), the concentration distribution of semiconductor impurity is measured, which is simple and fast without destroying the sample. In order to obtain the distribution of semiconductor impurity concentration more quickly and accurately, the C-V curve of sample and the linear fitting of 1/C~2-V curve were plotted by Origin software, and the impurity concentration, self-built field and corresponding impurity concentration distribution curve were obtained quickly.
【作者单位】： 华南师范大学;
【分类号】：TN307
本文编号：2283880
[Abstract]:Based on the capacitance-voltage method (C-V method), the concentration distribution of semiconductor impurity is measured, which is simple and fast without destroying the sample. In order to obtain the distribution of semiconductor impurity concentration more quickly and accurately, the C-V curve of sample and the linear fitting of 1/C~2-V curve were plotted by Origin software, and the impurity concentration, self-built field and corresponding impurity concentration distribution curve were obtained quickly.
【作者单位】： 华南师范大学;
【分类号】：TN307
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本文编号：2283880
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