PCB数字光刻投影光学设计及其扫描与控制技术研究

发布时间：2018-11-04 17:34

【摘要】：随着个人电子设备朝多功能、微型化、轻薄化、系统高度集成化方向发展,高端个人电子产品,例如下一代智能手机、Pad、iPhone、数码相机等,其制造商需要生产出功能强大、但更节能的产品。然而面向下一代高端个人电子产品的制造,最重要的技术当属印刷电路板(PCB)的光刻。传统PCB光刻采用的是汞灯接近式的曝光技术,成本高、其光刻精度低,对环境污染大。而数字光刻无论从成本,精度,亦或是生产效率和对环境的影响,都有着传统PCB光刻无法比拟的优势。因此针对PCB制造进行数字光刻相关技术研究具有非常重要的意义。基于初级像差理论本文设计了一组适合0.7XGA DMD的光刻投影物镜,该投影物镜组具有双高斯对称结构。此结构是最容易消除五种初级像差的初始结构。由于只是满足微米级PCB光刻的需要,该投影物镜组放大率为-1,且不用非球面镜即能让物镜达到13.68gm的精度。它总共由8片镜片组成,前4片与后4片关于中心光阑对称,因此在加工时只需加工4个透镜的模具,这样既可以降低成本,又有利于光刻系统中透镜的装配。基于DMD的工作方式进行了数字光刻扫描技术研究,提出倾斜扫描的技术,它的优势是消除了DMD的栅格效应,提高了成像质量。结合所设计投影物镜组它既能实现整数倍像素以外的线宽,又能提高图像的分辨率。在DMD倾斜扫描模式下进行了光刻实验,取得了良好的实验结果,实现了非整数线宽,和其他方法用于该精度的曝光情形相比,像面照度均匀,线条清晰,边缘陡峭且线性度好,因而能很好地满足光刻的需要。数字无掩模光刻掩模图形的生成在实际应用中较为复杂,例如如何识别线矢量图形,将线矢量图形转换为适合每一个微镜的格栅图形,发送这些格栅图形到DMD控制器,便于微镜反射开／关的执行等,因此我们进行了数字光刻动态图形控制技术研究。提出一种基于区域的数字光刻掩模图形生成方法,介绍了该方法的设计思想和设计流程,并对该动态图形控制技术进行了比较分析,讨论了该技术的可行性。
[Abstract]:As personal electronics move towards multifunction, miniaturization, thinning, and systems integration, high-end personal electronics, such as next-generation smartphones, Pad,iPhone, digital cameras, and so on, require manufacturers to produce powerful capabilities. But more energy efficient products. However, for the next generation of high-end personal electronics manufacturing, the most important technology is printed circuit board (PCB) lithography. The traditional PCB lithography is based on mercury lamp exposure technology, which has the advantages of high cost, low lithography accuracy and great environmental pollution. Digital lithography has many advantages over traditional PCB lithography in terms of cost, precision, production efficiency and environmental impact. Therefore, it is of great significance to study the digital lithography technology for PCB manufacturing. Based on the primary aberration theory, a set of photolithographic objective lenses suitable for 0.7XGA DMD is designed in this paper, which has a double Gao Si symmetry structure. This structure is the most easy to eliminate five primary aberrations of the initial structure. Because it only meets the need of micron PCB lithography, the magnification of the projective objective group is -1, and the objective lens can achieve the accuracy of 13.68gm without non-spherical lens. It consists of a total of 8 lenses. The first four pieces are symmetrical with the latter four pieces about the central aperture. Therefore, only four lens molds need to be machined, which can not only reduce the cost but also facilitate the assembly of the lenses in the lithography system. Based on the working mode of DMD, the digital lithography scanning technology is studied, and the tilted scanning technique is proposed. Its advantage is to eliminate the grid effect of DMD and improve the imaging quality. Combined with the designed projection objective group, it can not only realize the linewidth beyond integer pixels, but also improve the resolution of the image. The experiments of lithography in DMD tilt scanning mode are carried out, and good experimental results are obtained, and the non-integer linewidth is realized. Compared with other methods, the image plane illumination is uniform, the lines are clear, the edges are steep and the linearity is good. So it can satisfy the need of lithography. The generation of digital mask patterns is more complicated in practical applications. For example, how to recognize line vector graphics, convert line vector graphics into grid graphics suitable for each micromirror, and send these grid graphics to DMD controller. It is convenient to perform on / off of micromirror reflection, so we study the dynamic graphic control technology of digital lithography. A method of generating digital lithography mask graphics based on region is proposed. The design idea and design flow of this method are introduced. The dynamic graphic control technology is compared and analyzed, and the feasibility of this technique is discussed.
【学位授予单位】：广东工业大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN41;TN305.7

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