飞秒激光脉冲能量累积优化对黑硅表面形貌的影响
[Abstract]:The microstructure prepared on the surface of black silicon can obtain many kinds of surface functions, which have been widely used in solar energy, detector and other fields. Therefore, the formation mechanism and preparation conditions of black silicon microstructures have been the focus of attention. It is found that with the increase of laser irradiation (increasing the energy of single pulse or increasing the number of accumulated pulses), the bottleneck effect of morphology size growth will be encountered: too much energy accumulation has no further effect on the optimization and control of microstructure. The theoretical calculation results show that this phenomenon is caused by the modulation of the energy absorption of the current laser pulse by the microstructure induced by the front sequence femtosecond laser pulse, which reduces the effective ablation efficiency of the current laser pulse. According to this law of femtosecond laser ablation, a new scheme for optimizing the surface morphology is proposed, under the condition that the total energy of irradiated laser is constant. The surface morphology can be optimized by changing the distribution of laser energy (the combination of single pulse energy and pulse number). This new method can not only improve the preparation efficiency of black silicon, but also reduce the surface defects and damage caused by femtosecond processing, and reduce the energy consumption in the process. This research result is of great significance to the further improvement of black silicon properties and its engineering application.
【作者单位】: 长春理工大学理学院;光电信息控制和安全技术重点实验室;
【基金】:国家自然科学基金(批准号:61605017) 长春市科技计划(批准号:14KP007) 长春理工大学青年科学基金(批准号:XQNJJ-2015-01) 光电信息控制和安全技术重点实验室基金资助的课题~~
【分类号】:TN249;TN304.12
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