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紫外光刻技术制备各向异性超疏水表面

发布时间:2018-11-28 16:49
【摘要】:结合紫外光刻技术与湿化学刻蚀法,将掩模板上的条纹结构转移到锌基体上;然后利用月桂酸修饰降低表面能,制备出具有不同间距条纹结构的各向异性超疏水表面。使用接触角测量仪表征其浸润性、偏光显微镜表征其形貌结构、傅里叶红外光谱仪分析表面成分,利用接触角测量仪搭建简易的平台探究制备的具有条纹结构的各向异性超疏水表面的减阻性能。掩模板上5、10、15、30μm间距的条纹图案很好地转移到了锌基体上,经月桂酸修饰后接触角最高达156.26°。当间距d=30μm时,各向异性浸润性最显著,ΔCA=9.93°。实验表明可通过调节条纹间距来控制各向异性浸润性,各向异性浸润性程度ΔCA随条纹间距的增加而增加,平行于各向异性超疏水表面的条纹结构方向有一定的减阻性能。利用该方法可制备特殊结构的各向异性超疏水表面,用于流体定向减阻与运输,微流体器件等领域。
[Abstract]:In combination with UV lithography and wet chemical etching, the stripe structure on the mask was transferred to zinc matrix, and the surface energy was reduced by lauric acid modification, and anisotropic superhydrophobic surfaces with different stripe structures were prepared. The contact angle measurement instrument was used to characterize its wettability, the polarizing microscope was used to characterize its morphology and structure, and the surface composition was analyzed by Fourier transform infrared spectrometer. A simple platform was built by using contact angle measuring instrument to explore the drag reduction performance of anisotropic superhydrophobic surface with striped structure. The stripe pattern with a distance of 5 ~ 10 ~ 1530 渭 m on the mask was transferred to the zinc base well, and the contact angle was up to 156.26 掳after the modification of lauric acid. When the spacing is 30 渭 m, the anisotropic wettability is the most significant, 螖 CA=9.93 掳. The experimental results show that the anisotropic wettability can be controlled by adjusting the stripe spacing. The degree of anisotropic wettability 螖 CA increases with the increase of stripe spacing, and the stripe structure parallel to the anisotropic superhydrophobic surface has a certain drag reduction performance. This method can be used to fabricate anisotropic superhydrophobic surfaces with special structures for directional drag reduction and transportation of fluids, microfluid devices and so on.
【作者单位】: 湖北师范大学物理与电子科学学院;湖北理工学院矿区环境污染控制与修复重点实验室;
【基金】:国家自然科学基金(51272082) 青年科学基金(21603070)资助
【分类号】:TN23

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