非球面技术在浸没式光刻照明系统中的应用

发布时间：2019-04-02 03:53

【摘要】：NA1.35浸没式光刻照明系统是超大规模集成电路的核心设备,为了实现从Ar F激光器发出的光束经过一系列模块传输后到达掩模面的能量满足光刻曝光系统的要求,需要在系统中引入非球面透镜,以减少镜片数量,提高能量利用率。为解决现在非球面透镜具有的加工难度和控制精度不足的缺陷,设计出一种优化控制保证非球面加工和检测的方法。在光学系统设计中优化非球面的形状,保证非球面度,满足非球面变化率在可加工和检测的范围内,并控制非球面拐点的产生。照明系统中镜片数量最多的模块是耦合镜组,通过非球面的优化,镜片数量从12片减少到9片,系统能量利用率提高近25%。此外,提高了系统像质NA一致性,像方远心度,弥散斑直径和畸变,满足了曝光光学系统对掩模面的能量要求,故该非球面控制技术具有良好的可加工性和可检测性。
[Abstract]:The NA1.35 immersion lithography lighting system is the core equipment of very large scale integrated circuit (VLSI). In order to realize the energy of the beam from the Ar F laser to reach the mask surface after transmission through a series of modules, it meets the requirement of the lithography exposure system. Aspheric lenses need to be introduced into the system to reduce the number of lenses and improve the energy efficiency. In order to solve the problem of machining difficulty and insufficient control precision of aspheric lens, an optimized control method is designed to ensure aspherical machining and testing. In the design of optical system, the shape of aspheric surface is optimized, the degree of aspheric surface is guaranteed, the rate of change of aspheric surface is within the range of machining and testing, and the generation of aspheric inflection point is controlled. The largest number of lenses in the lighting system is the coupling lens group, through the optimization of aspherical surface, the number of lenses is reduced from 12 to 9, and the energy utilization of the system is increased by nearly 25%. In addition, the image quality NA consistency of the system is improved, such as square telecentric degree, dispersion speckle diameter and distortion, which meet the energy requirements of the exposure optical system for the mask surface. Therefore, the aspheric control technique has good machinability and detectability.
【作者单位】：长春理工大学;长春理工大学光电信息学院;
【基金】：国家自然科学基金(91338116,11474037)
【分类号】：TH74;TN47

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