化学气相沉积法制备氮化硼纳米管的研究进展:反应装置、气源材料、催化剂

发布时间：2018-02-20 19:33

本文关键词： 氮化硼纳米管化学气相沉积硼源催化剂　出处：《材料导报》2017年19期 　论文类型：期刊论文

【摘要】：氮化硼纳米管(BNNTs)具有优良的耐高温、抗氧化、防辐射、绝缘和导热性能,因此,在航空航天、辐射屏蔽、热界面材料以及深紫外发射等领域具有潜在的应用前景。然而,高品质BNNTs的可控制备和批量生产仍然是学术和工业界的重大挑战。在BNNTs的众多制备方法中,化学气相沉积法(CVD)是最有潜力实现其可控制备的方法之一。但是,科学家们对于CVD法制备BNNTs的催化机理和影响因素尚未形成共识。鉴于此,文章从反应装置、氮源、硼源和催化剂4个方面对CVD法制备BNNTs进行了综述,并系统总结了相应的规律。在此基础上,分析了目前BNNTs可控制备中存在的问题,并对CVD法在BNNTs可控制备中的作用进行了展望,以期对今后BNNTs的制备起到借鉴作用。
[Abstract]:Boron nitride nanotubes (BNNTs) have potential applications in aerospace, radiation shielding, thermal interface materials and deep ultraviolet emission due to their excellent high temperature resistance, oxidation resistance, radiation resistance, insulation and thermal conductivity. The controllable preparation and mass production of high quality BNNTs is still a major challenge for both academia and industry. Among the many preparation methods of BNNTs, chemical vapor deposition (CVD) is one of the most promising methods for its controllable preparation. There is no consensus among scientists on the catalytic mechanism and influencing factors of the preparation of BNNTs by CVD. In view of this, the preparation of BNNTs by CVD is reviewed from four aspects: reaction unit, nitrogen source, boron source and catalyst. On the basis of this, the problems existing in the controllable preparation of BNNTs are analyzed, and the function of CVD method in the controllable preparation of BNNTs is prospected in order to provide reference for the preparation of BNNTs in the future.
【作者单位】：武汉科技大学耐火材料与冶金国家重点实验室;中国科学院苏州纳米技术与纳米仿生研究所;
【基金】：国家自然科学基金(51522211) 中国科学院苏州纳米技术与仿生研究所纳米器件与应用重点实验室项目(15QT02)
【分类号】：TB383.1;TQ128

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