多孔玻璃的制备、镀膜及性能研究

发布时间：2018-03-10 11:44

本文选题：磁控溅射　切入点：多孔玻璃　出处：《海南大学》2017年硕士论文　论文类型：学位论文

【摘要】：随着镀膜玻璃这一产业的不断发展,对镀膜玻璃的需求会越来越高,行业标准也越来越严格,因此,开发性能优越的镀膜玻璃已经成为当今研究的热点。本文从提高镀膜玻璃的可见光透过率和提高镀膜玻璃的膜基结合力两个方面,分别开发了两种新型玻璃基板,并对其进行镀膜,研究了这两种新型镀膜玻璃在所需性能上的影响。首先为了提高镀膜玻璃的可见光透过率,本研究通过反胶束溶液刻蚀法制备出一种新型玻璃基板,即多孔增透玻璃。表面形成了蜂窝状的多孔膜层,减小了可见光的反射率,从而使可见光平均透过率提高了 7%。由于避免了使用HF或氟硅酸,因此这种化学刻蚀环境友好。随后通过一系列射频磁控溅射实验,探究出了可见光平均透过率高,紫外截止率最高的最佳条件。在此条件下,分别在制备的多孔增透玻璃和普通玻璃上镀CeO2/TiO2防紫外线膜。并采用紫外-可见分光光度计、SEM、XRD、XPS等测试手段对样品进行了分析表征。结果表明,在相同的镀膜条件下,当镀膜后多孔增透玻璃与镀膜普通玻璃的紫外光阻隔率均为99%时,多孔增透玻璃镀膜后的可见光平均透过率为85%,而普通玻璃镀膜后的可见光平均透过率仅为79%。此外,由于玻璃表面上的孔结构也提高了薄膜与基板的接触面积,膜基结合力提高2倍左右。此外,为了提高薄膜与基板之间的结合力,本研究提出了反胶束蚀刻技术,在玻璃基板表面产生微米级尺寸的球形凹坑,来提高基板粗糙度,从而增加膜基结合力。当蚀刻的玻璃用作镀膜的基板时,镀膜的材料将嵌入这些凹坑中并获得波状的3D膜。由于与平板玻璃上的薄膜相比,微米级孔坑玻璃的接触表面大大增加,因此可以显著增强薄膜对玻璃的粘附性。蚀刻技术增大了玻璃基板的粗糙度约9～20倍,膜基结合力提高了 2～4倍,不仅增强了膜与基板的粘附性,而且增强了膜与膜的粘附性在蚀刻的玻璃上沉积可产生更致密的薄膜。与此同时,这些薄膜表现出更高的硬度,杨氏模量和导电性。
[Abstract]:With the continuous development of coated glass industry, the demand for coated glass will be higher and higher, and the industry standards will become more and more strict. In this paper, two new glass substrates have been developed from the aspects of improving the visible light transmittance of the coated glass and improving the adhesion of the film substrate of the coated glass. In order to improve the visible light transmittance of the coated glass, a new glass substrate was prepared by reverse micelle etching. That is, porous antireflective glass. A honeycomb porous film is formed on the surface, which reduces the reflectivity of visible light, thus increasing the average transmittance of visible light by 7%. The use of HF or fluorosilicic acid is avoided because the use of HF or fluorosilicic acid is avoided. Therefore, this kind of chemical etching environment is friendly. Subsequently, through a series of RF magnetron sputtering experiments, the optimum conditions for the high average transmittance of visible light and the highest UV cut-off rate are found. CeO2/TiO2 anti-UV films were prepared on porous antireflective glass and common glass respectively. The samples were characterized by UV-Vis spectrophotometer (SEMXRDX XPS). The results showed that under the same coating conditions, the samples were prepared. The average visible light transmittance of porous antireflective glass after coating is 85 and that of common glass is only 79 when the UV barrier ratio of porous antireflective glass and common glass after coating is both 99k.The average visible light transmittance of porous antireflective glass after coating is 85cm, and that of common glass is only 79g. Because the pore structure on the surface of glass also increases the contact area between the film and the substrate, the adhesion of the film to the substrate is increased by about 2 times. In addition, in order to improve the adhesion between the film and the substrate, the reverse micelle etching technique is proposed. Spherical pits of micron size are produced on the surface of the glass substrate to improve the roughness of the substrate, thereby increasing the adhesion of the film substrate. When etched glass is used as the substrate for coating, The coating material will be embedded in these pits and a wave-like 3D film will be obtained. Because the contact surface of the micrometer porous pit glass is greatly increased compared with the thin film on the flat glass, As a result, the adhesion of the film to glass was significantly enhanced. The roughness of the glass substrate was increased by 9 ~ 20 times, and the adhesion of the film to the substrate was increased by 2 ~ 4 times, which not only enhanced the adhesion of the film to the substrate, but also increased the adhesion of the film to the substrate. Moreover, the adhesion between the films and the films is enhanced and the films are deposited on the etched glass to produce denser films. At the same time, these films exhibit higher hardness, Young's modulus and electrical conductivity.
【学位授予单位】：海南大学
【学位级别】：硕士
【学位授予年份】：2017
【分类号】：TQ171.1

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