抛光液分散性对K9光学玻璃表面粗糙度影响研究

发布时间：2018-03-20 04:31

本文选题：K9光学玻璃　切入点：抛光液　出处：《中国科学院研究生院（光电技术研究所）》2015年硕士论文　论文类型：学位论文

【摘要】：K9光学玻璃作为现代光学制造工程中常见的典型光学材料,广泛应用于民用和国防领域。随着光学系统精度要求不断提高,光学元件表面粗糙度要求也在不断提高。抛光液作为化学机械抛光过程中不可缺少的元素,在光学玻璃加工中占有重要位置,其性能是决定光学元件抛光表面质量的重要因素,抛光液的分散性好坏直接决定着参与抛光过程的磨料粒子的粒径大小。本文在传统抛光方法的基础上,针对抛光液的分散性对表面粗糙度影响两方面展开理论研究和实验性研究。研究成果成功应用于小口径平面K9光学玻璃工件抛光,最终获得小于0.3nm的表面粗糙度值。1)建立了单颗粒磨料抛光过程模型,并根据光滑粒子动力学(SPH)原理,利用ANSYS/LS-DYNA模拟仿真了单颗粒磨料抛光K9光学玻璃元件的过程。并针对仿真实验做了相应的抛光实验,理论结果和实验结果相互吻合,得到了K9光学玻璃工件表面粗糙度与磨料粒径之间的关系。而抛光液的分散性又直接决定着参与抛光磨料粒径的大小,所以对于表面粗糙度与磨料粒径关系的研究对后续研究抛光液分散性具有重要的意义。2)根据单颗粒磨料抛光仿真结果,利用表面粗糙度计算原理和数值统计学原理,计算出仿真模拟中单元表面粗糙度值。建立了单元表面粗糙度与颗粒粒径以及压入深度之间的关系数值模型,并通过模拟表面单元与表面环带以及整个表面之间的关系建立了模拟表面粗糙度与颗粒粒径之间的数值关系模型。3)提出通过图像灰度值处理方法表征抛光液分散性,研究各种抛光液的分散性情况。基于氧化铈悬浮液静电稳定机制,通过添加六偏磷酸钠分散剂来调节抛光液分散性,六偏磷酸钠用量为3%wt时抛光液分散性最好;在六偏磷酸钠用量3%wt时,抛光液在偏酸性或偏碱性条件下分散性要明显好于偏中性条件。基于氧化铈悬浮液空间位阻稳定机制,通过添加阿拉伯树胶分散剂来调节抛光液分散性,阿拉伯树胶用量为1%wt时抛光液分散性最好;在阿拉伯树胶用量1%wt时,各种p H值抛光液分散性相差不大,在偏酸性或偏碱性条件下略好于偏中性条件。4)通过抛光实验研究,K9光学玻璃工件表面粗糙度与抛光液分散性之间的关系取决于抛光液的酸碱性。抛光液在偏酸性和偏碱性条件下,抛光工件表面粗糙度值与抛光液分散性没有直接的关系;抛光液在中性条件下,抛光工件表面粗糙度值与抛光液分散性关系为:抛光液分散性越好,抛光工件表面粗糙度值越好;
[Abstract]:As a typical optical material in modern optical manufacturing engineering, K9 optical glass is widely used in civil and national defense fields. As an indispensable element in the process of chemical and mechanical polishing, polishing liquid occupies an important position in optical glass processing, and its performance is an important factor to determine the surface quality of optical elements. The dispersity of the polishing liquid directly determines the particle size of the abrasive particles involved in the polishing process. The theoretical and experimental studies on the effect of the dispersion of the polishing liquid on the surface roughness were carried out. The results were successfully applied to the polishing of small aperture plane K9 optical glass workpiece. Finally, the surface roughness value of less than 0.3 nm was obtained. The model of single particle abrasive polishing process was established, and according to the principle of smooth particle dynamics (SPH), The process of polishing K9 optical glass element with single particle abrasive is simulated by ANSYS/LS-DYNA, and the corresponding polishing experiment is done for the simulation experiment. The theoretical results are in good agreement with the experimental results. The relationship between surface roughness and abrasive particle size of K9 optical glass workpiece is obtained. Therefore, the study on the relationship between surface roughness and abrasive particle size is of great significance for further study on the dispersion of polishing liquid. 2) according to the simulation results of single particle abrasive polishing, the calculation principle of surface roughness and the principle of numerical statistics are used. The numerical model of the relationship between the surface roughness of the element and the particle size and the depth of indentation is established. The numerical model of the relationship between surface roughness and particle size is established by simulating the relationship between surface elements and surface bands and the whole surface. 3) the image gray value processing method is proposed to characterize the dispersion of the polishing liquid. Based on the electrostatic stabilization mechanism of cerium oxide suspension, the dispersity of the polishing liquid is adjusted by adding sodium hexametaphosphate dispersant. The dispersity of the polishing liquid is the best when the amount of sodium hexametaphosphate is 3 wt. When the amount of sodium hexametaphosphate was 3wt, the dispersion of the polishing liquid was better than that of neutral solution under the condition of partial acidity or alkalinity. Based on the steric stability mechanism of cerium oxide suspension, When the amount of Arabic gum is 1wt, the dispersity of polishing liquid is the best, and when the amount of Arabic gum is 1wt, the dispersity of all kinds of pH polishing fluids is not different. The relationship between the surface roughness of optical glass workpiece and the dispersity of polishing solution depends on the acidity and basicity of the polishing liquid. And alkalinity, The surface roughness of polished workpiece has no direct relation with the dispersity of polishing liquid, and the relationship between the surface roughness value of polished workpiece and the dispersity of polishing liquid is as follows: the better the dispersion of polishing liquid, the better the surface roughness value of polishing workpiece is. The surface roughness value of polished workpiece is better;
【学位授予单位】：中国科学院研究生院（光电技术研究所）
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TQ171.684

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