微纳混合结构黑硅的制备及其关键工艺技术讨论

发布时间：2018-04-08 09:15

本文选题：金字塔结构　切入点：微纳混合结构　出处：《发光学报》2017年11期

【摘要】：黑硅是一种能大幅提高器件光电转换效率的新型电子材料,微纳混合结构黑硅是一种比普通黑硅材料更高效的新型黑硅材料,如何制备出大面积、形貌特征好、表面洁净度高的黑硅材料是制备高效的黑硅太阳能电池的前提。首先,利用湿法腐蚀方法,通过设计合适的反应固体装置和良好的工艺控制手段,在金字塔硅表面制备了大面积的微纳混合结构黑硅;然后,对其制备的关键工艺技术进行了研究讨论。实验结果表明,该方法制备的微纳混合结构黑硅具有形貌特征好、表面洁净度高和低表面反射率等特征。有效去除表面银沉积物后,该黑硅在300~1 100 nm范围内的加权平均反射率低至4.06%。该制备工艺方法适用于大面积高效微纳混合结构黑硅的规模制备,在高效黑硅太阳能电池领域具有重要的应用价值。
[Abstract]:Black silicon is a new type of electronic material which can greatly improve the photoelectric conversion efficiency of devices. The micro / nano hybrid structure black silicon is a new type of black silicon material which is more efficient than ordinary black silicon materials.Black silicon with high surface cleanness is the prerequisite for the preparation of high efficiency black silicon solar cells.Firstly, a large area of micro-nano mixed structure black silicon was prepared on the surface of pyramidal silicon by using wet etching method, through the design of appropriate reaction solid device and good process control method, and then the micro-nano mixed structure black silicon was prepared on the surface of pyramidal silicon.The key technology of its preparation was studied and discussed.The experimental results show that the micro-nano mixed structure black silicon prepared by this method has good morphology, high surface cleanliness and low surface reflectivity.After removing silver deposits from the surface effectively, the weighted average reflectance of the black silicon in the range of 300 ~ 1 100 nm is as low as 4.06.The method is suitable for the large-scale preparation of large-area high-efficiency micro-nano mixed structure black silicon, and has important application value in the field of high-efficiency black silicon solar cells.
【作者单位】：玉林师范学院物理科学与工程技术学院复杂系统优化与大数据处理广西高校重点实验室;
【基金】：玉林师范学院校级科研项目(2015YJYB05)资助~~
【分类号】：TQ127.2

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