去除光学器件弹光双折射的方法

发布时间：2018-05-25 21:20

本文选题：弹光效应 + 双折射　；参考：《物理学报》2016年03期

【摘要】：在电光、磁光调制器和传感器等光学器件的制作和使用过程中,经常会产生影响器件性能的弹光双折射.根据折射率椭球分析法,通过系统分析各晶系晶体的弹光效应,提出了若干去除光学器件中静态弹光双折射的方法.主要结论包括:对于正交晶系的双轴晶体,当光波沿着晶体任意一个主轴方向传播时,如果作用于晶体另外两个主轴方向的应力能够满足某一与晶体自身参数有关的倍数关系且不存在剪切应力,则可以去除这两个应力引起的弹光双折射;对利用所有单轴晶体,ˉ43m,432,m3m点群的立方晶体和匀质光学玻璃制作的光学器件,如果能够保持晶体沿着x1,x2轴方向的正应力相等且不存在剪切应力,或只对晶体施加x3方向的正应力,也可以避免沿着晶体主光轴x3方向传播光波的弹光双折射.上述去除弹光双折射的方法对光学器件的设计、制作和使用具有重要参考价值.
[Abstract]:In the process of fabrication and application of optical devices such as electro-optic magneto-optic modulators and sensors the elasto-optical birefringence which affects the performance of the devices is often produced. Based on the ellipsoid analysis of refractive index and the systematic analysis of the elastic-light effect of each crystal system, some methods for removing static elastic-optical birefringence from optical devices are proposed. The main conclusions are as follows: for biaxial crystals of orthogonal system, when the light wave propagates along any principal axis of the crystal, If the stress acting on the other two principal axes of the crystal can satisfy a multiple relation related to the crystal parameters and there is no shear stress, the elastic-optical birefringence caused by the two stresses can be removed. For the optical devices made from all uniaxial crystals, cubic crystals with a cluster of points of 43m and 432m3m and homogeneous optical glass, if the normal stress along the axis of x1x2 can be kept equal and there is no shear stress, or if the normal stress in the x3 direction is applied only to the crystal, The elastic-optical birefringence of light wave propagating along the main axis x 3 of the crystal can also be avoided. The above methods of removing elasto-optical birefringence have important reference value for the design, fabrication and application of optical devices.
【作者单位】：北京航空航天大学仪器科学与光电工程学院;
【分类号】：O734

【相似文献】