MPCVD中双基片结构对等离子体的影响研究

发布时间：2018-03-21 17:24

本文选题：化学气相沉积　切入点：发射光谱　出处：《真空科学与技术学报》2017年05期 　论文类型：期刊论文

【摘要】：在传统的波导耦合微波等离子体化学气相沉积装置中引入双基片结构,测量了金刚石沉积过程中的等离子体发射光谱,通过与单基片结构对比,比较研究了双基片对微波等离子体参数的影响。研究表明:在相同金刚石沉积参数下,双基片结构相比于单基片结构下等离子体基团强度更高。其中H_α基团强度远高于单基片台下H_α基团强度;随着甲烷浓度的增加,双基片结构下C_2基团强度上升更加显著,且在相同条件下,双基片结构下C_2与H_α的比值更小,有利于提高金刚石膜的质量。此外,双基片结构下等离子体电子温度较低且随气压的上升而进一步降低。
[Abstract]:In the conventional waveguide coupled microwave plasma chemical vapor deposition (MPCVD) device, the plasma emission spectra of diamond deposition process were measured by introducing the double substrate structure, and the results were compared with that of the single substrate structure. The effects of double substrates on the parameters of microwave plasma are compared. The results show that: under the same diamond deposition parameters, The strength of plasma group in double substrate structure is higher than that in single substrate structure, the strength of H _ 伪 group is much higher than that of H _ 伪 group under single substrate, and the strength of C _ 2 group increases more significantly with the increase of methane concentration. Under the same conditions, the ratio of C _ 2 to H _ 伪 is smaller in the dual-substrate structure, which is beneficial to improve the quality of diamond film. In addition, the electron temperature of the plasma in the dual-substrate structure is lower and further decreases with the increase of the pressure.
【作者单位】：武汉工程大学材料科学与工程学院湖北省等离子体化学与新材料重点实验室;
【基金】：国家自然科学基金项目
【分类号】：TQ163

【相似文献】