峰值功率对高功率脉冲磁控溅射氮化铬薄膜力学性能的影响

发布时间：2018-03-27 19:51

本文选题：高功率脉冲磁控溅射　切入点：峰值功率　出处：《表面技术》2017年01期

【摘要】：目的采用高功率脉冲磁控溅射(HIPIMS)制备力学性能优良的氮化铬薄膜。方法采用HIPIMS技术,利用铬靶及氩气、氮气,在不同峰值功率(52.44,91.52,138 k W)下沉积了氮化铬薄膜。采用X射线衍射技术(XRD)、扫描电子显微镜(SEM)、纳米硬度计、摩擦磨损试验机、划痕仪等评价方法,研究了峰值功率对薄膜组织结构和力学性能的影响。结果当峰值功率为52 k W时,靶材原子与离子的比值仅为5.4%,所生成氮化铬薄膜的晶粒尺寸较小,薄膜出现剥落的临界载荷为42 N,薄膜的磨损深度达到349 nm;当峰值功率提高到138 k W时,靶材原子与离子的比值为12.5%,在最大载荷100 N时,薄膜也未出现剥落,同时磨损深度仅为146 nm。结论高的峰值功率能够提高靶材原子离化率和离子对基片的轰击效应,使氮化铬薄膜晶粒重结晶而长大,消除部分应力,使薄膜表现出优良的耐磨性和韧性,因此提高靶材峰值功率可以提高氮化铬薄膜的力学性能。
[Abstract]:The purpose of using high power pulsed magnetron sputtering (HIPIMS) chromium nitride thin films with excellent mechanical properties. The preparation method adopts HIPIMS technology, using chromium target and argon, nitrogen, in different peak power (52.44,91.52138 K W) the chromium nitride films deposited by X ray diffraction (XRD), scanning electron microscopy (SEM), nano hardness tester, friction wear tester, scratch tester evaluation method, studied the effect of peak power on the structure and mechanical properties of the film organization. Results when the peak power is 52 K W, the ratio of target atoms and ions is only 5.4%, smaller grain size generated chromium nitride films, films appeared critical load peel is 42 N, the wear depth of thin film is 349 nm; when the peak power is increased to 138 K W, the ratio of target atoms and ions is 12.5%, the maximum load of 100 N, the film did not appear peeled off, while the wear depth is only 146 Conclusion the high peak power of nm. can improve the target atomic ionization and ion bombardment effect on substrate, the chromium nitride film grain recrystallization and growth, eliminate stress, the films exhibit excellent wear resistance and toughness, therefore improve the target peak power can improve mechanical properties of chromium nitride film.

【作者单位】：西南交通大学材料科学与工程学院;荆楚理工学院;中国工程物理研究院;
【基金】：湖北省教育厅科技项目基金(Q20164301) 国家自然科学基金委员会与中国工程物理研究院联合基金(U1330113) 国家自然科学基金(31300787)~~
【分类号】：TQ136.11;TB383.2

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