刻蚀工艺对四面体非晶碳膜生长及其性能的影响

发布时间：2018-05-10 23:22

本文选题：四面体非晶碳膜 + 辉光刻蚀　；参考：《表面技术》2017年04期

【摘要】：目的研究不同等离子体刻蚀工艺对基体和四面体非晶碳膜(ta-C)的影响,并进一步考察不同电弧等离子体刻蚀时间对ta-C薄膜结构的影响。方法采用自主设计研制的45°单弯曲磁过滤阴极真空电弧镀膜设备,进行不同等离子体刻蚀以及ta-C薄膜的沉积。使用等离子体发射光谱仪表征离子种类及其密度,使用椭偏仪表征薄膜厚度,原子力显微镜表征刻蚀后的基体粗糙度,拉曼光谱仪和XPS表征薄膜结构,TEM分析薄膜的膜基界面结构。结果辉光刻蚀工艺中,作用的等离子体离子以低密度的Ar离子为主;而电弧刻蚀时,作用的等离子体离子为高密度的Ar离子和少量的C离子,并且能够在基体表面形成约15 nm的界面层,并实现非晶碳膜(a-C)的预沉积。随电弧等离子体刻蚀时间增加,ta-C薄膜的sp3含量有所降低。结论相比于辉光刻蚀,电弧刻蚀利于制备较厚的ta-C薄膜。这主要是因为电弧刻蚀时,基体表面形成良好的界面混合层,并预沉积了非晶碳膜,形成a-C/ta-C的梯度结构,有助于增强膜基结合力。
[Abstract]:Aim to study the effect of different plasma etching processes on the substrate and tetrahedron amorphous carbon film, and to investigate the effect of different arc plasma etching time on the structure of ta-C film. Methods the vacuum arc plating equipment with 45 掳single bending magnetic filter cathode was designed and developed by ourselves. Different plasma etching and deposition of ta-C thin film were carried out. The plasma emission spectrometer was used to characterize the ion type and density, the ellipsometer was used to characterize the thickness of the film and the atomic force microscope (AFM) was used to characterize the roughness of the etched substrate. The structure of the films was characterized by Raman spectroscopy and XPS. Results in the glow etching process, the low density ar ion was the main plasma ion, while the high density ar ion and a small amount of C ion were used in the arc etching. An interface layer of about 15 nm can be formed on the substrate surface, and the amorphous carbon film a-C) can be predeposited. With the increase of arc plasma etching time, the sp3 content of Ta-C thin films decreases. Conclusion compared with glow etching, arc etching is beneficial to the preparation of thick ta-C films. This is mainly due to the formation of a good interfacial mixed layer on the substrate surface during arc etching and the pre-deposition of amorphous carbon film to form the gradient structure of a-C/ta-C, which is helpful to enhance the adhesion of the film substrate.
【作者单位】：上海大学材料科学与工程学院;中国科学院宁波材料技术与工程研究所中国科学院海洋新材料与应用技术重点实验室;中国科学院宁波材料技术与工程研究所浙江省海洋材料与防护技术重点实验室;江西省科学院应用物理研究所;
【基金】：国家自然科学基金面上项目(51371187) 江西省科技项目(20161ACE50023) 浙江省公益项目(2016C31121)~~
【分类号】：TQ127.11;TB383.2

【相似文献】