光纤原料高纯四氯化硅精制工艺研究

发布时间：2018-06-08 06:03

本文选题：四氯化硅 + 流程模拟　；参考：《天津大学》2015年硕士论文

【摘要】：针对目前国内多晶硅行业内普遍存在的副产物四氯化硅处理难题,本文提出了使用副产物四氯化硅精制提纯,制备高纯四氯化硅作为光纤原料的工艺过程,并使用Aspen Plus软件通过流程模拟、设计优化和流程改进,达到了理想的效果。本文的主要研究工作和结果如下:(1)从多晶硅副产物冷氢化高沸物出发,以光纤原料品质需求为目标,设计模拟了精馏法精制高纯四氯化硅的工艺流程,谈论相关设计和操作参数对工艺的影响,包括塔板数、回流比数、进料位置等,确定了最佳的工艺条件,通过模拟该工艺产品四氯化硅纯度达到99.99999%以上,满足光纤原料品质要求。(2)在原有设计工艺流程上,使用差压热耦合节能技术对原工艺进行改进,对比了差压热耦合技术精制四氯化硅工艺和原有工艺,结果表明使用差压热耦合能够在获得更高产品品质基础上降低能耗40%以上,同时还节省了设备投资,具有很高的应用前景。(3)提出了将隔壁精馏技术应用在精制高纯四氯化硅过程中,运用Aspen Plus软件使用对工艺进行了模拟和优化。优化为:全塔高度150块理论板,预分离段高度119块理论板,公共精馏段高度20块理论板,公共提馏段高度11块理论板,进料位置为第69块塔板,采出位置为第80块塔板,液相分配比为1.8,气相分配比为0.7。结果表明隔壁精馏塔工艺产品纯度优于原工艺,并且节约能耗20%以上,还能大大降低设备投资,具有高效节能的优点(4)对吸附法精制四氯化硅工艺进行了探索性研究,研究了四氯化硅中硼杂质的吸附除杂过程,讨论了吸附条件对吸附过程的影响,包括吸附剂种类、用量、含水量、吸附温度和吸附时间等。发现使用A21树脂对四氯化硅中硼杂质有很好的吸附效果,吸附过程是吸热过程,平衡时间较快,并且发现树脂中的水分能迅速与四氯化硅反应,影响吸附,因此工业应用时应尽量除去树脂中水分。此外,本文对吸附动力学进行研究,研究表明吸附过程满足Lagergren二级吸附动力学模型。
[Abstract]:In view of the difficult problem of processing silicon tetrachloride, which is a common by-product in polysilicon industry at present, the process of purification and purification of by-product silicon tetrachloride and the preparation of high purity silicon tetrachloride as raw material for optical fiber are put forward in this paper. The Aspen Plus software is used to simulate the process, optimize the design and improve the process, and achieve the ideal effect. The main work and results of this paper are as follows: (1) starting from the cold hydrogenation of polycrystalline silicon by-product and aiming at the quality requirement of optical fiber, the process of refining high purity silicon tetrachloride by distillation is designed and simulated. The effects of design and operation parameters on the process are discussed, including tray number, reflux ratio, feed position and so on. The optimum process conditions are determined. The purity of silicon tetrachloride is over 99.9999 9% by simulating the process product. In the original design process, the differential pressure and heat coupling energy saving technology was used to improve the original process, and the differential pressure and heat coupling technology for refining silicon tetrachloride was compared with the original process. The results show that the use of differential pressure and heat coupling can reduce the energy consumption by more than 40% on the basis of obtaining higher product quality, and also save the investment of equipment. It is suggested that the adjoining distillation technology be used in the process of refining high purity silicon tetrachloride. The process is simulated and optimized by using Aspen Plus software. Optimization is as follows: total tower height 150 theoretical plates, pre-separation section height 119 theoretical plates, common distillation section height 20 theoretical plates, public distillation section height 11 theoretical plates, feed position 69 trays, extraction position 80 trays, The liquid phase partition ratio is 1.8 and the gas phase distribution ratio is 0.7. The results show that the product purity of the next distillation column is superior to that of the original process, and the energy consumption is saved by more than 20%, and the equipment investment can be greatly reduced. It has the advantages of high efficiency and energy saving. The adsorption and impurity removal process of boron impurities in silicon tetrachloride was studied. The influence of adsorption conditions on the adsorption process was discussed, including kinds of adsorbents, amount of adsorbent, water content, adsorption temperature and adsorption time. It is found that the adsorption of boron impurities in silicon tetrachloride by A21 resin is an endothermic process, and the equilibrium time is fast. It is also found that the moisture in the resin can react with silicon tetrachloride quickly, which affects the adsorption. Therefore, the industrial application should be as far as possible to remove the moisture in the resin. In addition, the adsorption kinetics is studied in this paper. It is shown that the adsorption process meets the Lagergren second-order adsorption kinetics model.
【学位授予单位】：天津大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TQ127.2

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