等离子体刻蚀前处理对碳基薄膜结合力的影响

发布时间：2018-01-26 16:18

本文关键词： 等离子刻蚀阳极层离子源 M轴承钢钨掺杂类金刚石薄膜离子源功率　出处：《表面技术》2017年01期 　论文类型：期刊论文

【摘要】：目的通过等离子刻蚀处理使基体表面更洁净,从而提高薄膜与基体的结合力。方法采用阳极层离子源,通过不同的离子源功率和处理时间对M50轴承钢样品进行处理,并在处理过的样品表面制备钨掺杂类金刚石薄膜。利用原子力显微镜对等离子刻蚀处理前后的样品表面形貌进行研究,利用Raman光谱分析薄膜的微观结构,利用划痕仪对薄膜与基体的结合力进行研究。结果不同的离子源功率和刻蚀时间,得到了不同的基体微观表面粗糙度;钨掺杂类金钢石薄膜的D峰和G峰分别在1350 cm~(-1)附近和1580 cm~(-1)附近,为典型的类金刚石结构,ID/IG值在1.5左右;未经等离子刻蚀前处理样品的膜/基结合力是23 N;而优化等离子刻蚀前处理参数样品的膜/基结合力高达69 N,最佳的离子源功率和刻蚀时间为2 k W、60 min。结论等离子刻蚀前处理能够有效提高薄膜与基体的结合力。
[Abstract]:Objective to improve the adhesion between the substrate and the substrate by plasma etching. Methods the anodic layer ion source was used. M50 bearing steel samples were treated with different ion source power and treatment time. Tungsten doped diamond-like carbon films were prepared on the surface of the treated samples. The surface morphology of the samples before and after plasma etching was studied by atomic force microscope (AFM). The microstructure of the films was analyzed by Raman spectroscopy and the adhesion between the films and the substrate was studied by scratch analyzer. The results showed that the power of ion source and etching time were different. The surface roughness of different matrix was obtained. The D and G peaks of Tungsten doped austenitic steel thin films are near 1350 cm ~ (-1) and 1580 cm ~ (-1) respectively, which are typical diamond-like structures. ID/IG was about 1. 5; The film / base adhesion of the sample without plasma etching is 23N; The film / base adhesion of the optimized plasma etching parameters is as high as 69N. the optimum ion source power and etching time are 2 kW. Conclusion Plasma etching pretreatment can effectively improve the adhesion between the film and the substrate.
【作者单位】：中国农业机械化科学研究院;北京金轮坤天特种机械有限公司;
【分类号】：TG174.4
【正文快照】： Received:2016-06-08;Revised:2016-10-20随着现代工业的快速发展,对金属材料的性能提出了更高的要求,尤其是在硬度、耐高温、耐磨性等方面。通过在材料表面PVD制备耐磨自润滑薄膜,不仅可以有效地提高材料的耐磨性和使用寿命[1—5],降低基体材料的使用量,节省材料成本,同时也

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