抛光垫特性对硬质合金刀片CMP加工效果的影响

发布时间：2018-03-16 22:40

本文选题：化学机械抛光　切入点：硬质合金刀片　出处：《表面技术》2017年12期 　论文类型：期刊论文

【摘要】：目的研究不同种类的抛光垫对硬质合金刀片表面化学机械抛光(Chemical Mechanical Polishing/Planarization,CMP)加工过程的影响,为实现硬质合金刀片高效精密CMP加工提供有效参考。方法利用Nanopoli-100智能抛光机,通过自制的Al2O3抛光液,分别采用9种不同种类的抛光垫对牌号为YG8的硬质合金刀片进行CMP实验,将0~40、40~80、80~120 min三个加工阶段获得的材料去除率和表面粗糙度进行对比,同时观察最佳的表面形貌,分析抛光垫特性对CMP加工效果的影响。结果在抛光转速60 r/min,抛光压力177.8 k Pa的实验条件下,9种不同类型的抛光垫中仅有5种适合用于YG8硬质合金CMP加工。而且抛光垫的表面粗糙度在YG8刀片CMP加工过程中的影响最为显著,抛光垫表面粗糙度越高,CMP加工的材料去除率越高。此外,抛光垫的使用时间对CMP过程也有影响,抛光垫使用时间越长,CMP的材料去除率越小。结论 YG8硬质合金刀片经5种不同类型抛光垫CMP加工后,其表面的烧伤、裂纹等缺陷均得到了极大改善。当使用细帆布加工40 min时,材料去除率最高,为47.105 nm/min;当使用细帆布加工80min时,表面粗糙度最低,为0.039μm。
[Abstract]:Objective to study the effect of different kinds of polishing pads on the machining process of chemical Mechanical polishing chemical mechanical polishing (CMA) on the surface of cemented carbide inserts, and to provide an effective reference for the realization of high efficiency and precision CMP machining of cemented carbide inserts. Methods Nanopoli-100 intelligent polishing machine was used. Through Al2O3 polishing liquid, 9 different kinds of polishing pad were used to carry out CMP experiment on cemented carbide blade with YG8 grade, and the material removal rate and surface roughness obtained in three processing stages of 0 ~ (40) C ~ (40) C _ (40) C _ (40) C _ (40) C _ (40) C _ (40) C _ (80) C _ (120) min were compared. At the same time, the best surface morphology was observed, The effect of polishing pad characteristics on the processing effect of CMP was analyzed. Results under the experimental conditions of polishing speed 60 r / min and polishing pressure 177.8 KPA, only 5 of 9 different types of polishing pads were suitable for CMP processing of YG8 cemented carbide. The surface roughness of the light pad has the most significant effect on the CMP process of the YG8 blade. The higher the surface roughness of the polishing pad is, the higher the material removal rate is. In addition, the use time of the polishing pad also affects the CMP process. The longer the polishing pad is used, the smaller the material removal rate is. Conclusion the surface burn, crack and other defects of YG8 cemented carbide blade treated with five different types of polishing pad CMP have been greatly improved. When the fine canvas is used to process for 40 min, the surface defects such as burn and crack are greatly improved. The material removal rate was the highest (47.105 nm / min), and the surface roughness was the lowest (0.039 渭 m) when the fine canvas was used for 80 min.
【作者单位】：湘潭大学;湖南大学;
【基金】：湖南省自然科学基金项目(2017JJ4055) 湖南省科技厅科技计划重点研发项目(2016GK2014)~~
【分类号】：TG175

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