CVD金刚石涂层拉伸模具抛光设备研制及抛光技术研究

发布时间：2018-03-19 05:28

本文选题：CVD金刚石涂层　切入点：拉伸模具　出处：《南京航空航天大学》2017年硕士论文　论文类型：学位论文

【摘要】：通过化学气相沉积(CVD)直接得到的金刚石涂层表面粗糙且均匀性差,无法满足拉拔行业的要求,因此,对CVD金刚石涂层拉伸模具的工作面进行抛光是必不可少的一步。摩擦化学抛光以金刚石石墨化为基础,具有去除率高、设备简单等优点,应用前景广阔。本文从金刚石石墨化理论、微切削理论入手,分别采用摩擦化学抛光和机械抛光为粗、精加工工序,对CVD金刚石涂层拉伸模具工作面进行高效抛光。主要研究内容如下:(1)采用模块化的设计思路,分别对抛光设备进行了方案设计、机械结构设计、控制线路设计,并通过选材、加工、装配等后续处理,成功研制出了适合大孔径拉伸模具内孔CVD金刚石涂层抛光的设备。(2)针对摩擦化学抛光中出现的抛光盘磨损率高、材料去除率低等问题,本文从金刚石石墨化理论出发,根据摩擦化学抛光的材料要求,采用机械合金化-热压烧结技术成功制备出MnCuNi等五种新型合金抛光棒,并对它们的组织结构和力学性能进行了表征分析。(3)采用自制的合金棒进行摩擦化学抛光试验,结果表明:各合金抛光棒在金刚石的去除率及自身磨损率方面各不相同,其中MnCuNi合金棒抛光性能最好,去除率为1.58mg/h,磨损率最低为3.37mg/min;MnCuNi合金棒与电镀金刚石抛光头的抛光对比试验表明:在去除率、磨损率和性价比方面,摩擦化学抛光优于机械抛光。(4)采用粗精抛相结合的抛光工艺对大孔径CVD金刚石涂层拉伸模具工作面进行抛光实验,粗抛采用MnCuNi合金抛光棒,精抛采用电镀金刚石抛光头,研究表明:在一定的参数范围内,金刚石涂层的去除率随着速度和压强的增大而增大,表面粗糙度却呈现先减小后增大的趋势,即存在最优的线速度与压强;采用最优抛光工艺抛光(粗抛0.5h,精抛1.5h)后,金刚石涂层的表面粗糙度最低可达0.075μm。
[Abstract]:The surface of diamond coating obtained directly by chemical vapor deposition (CVD) is rough and poor uniformity, which can not meet the requirements of drawing industry. Polishing the working face of CVD diamond coating drawing die is an essential step. Tribochemical polishing is based on diamond graphitization and has the advantages of high removal rate and simple equipment. This paper starts with the theory of diamond graphitization and micro cutting, and adopts friction chemical polishing and mechanical polishing as rough and finishing processes, respectively. The main research contents are as follows: (1) adopting modular design idea, the polishing equipment is designed, mechanical structure design, control circuit design, and material selection. After processing and assembling, the equipment for polishing CVD diamond coating on the inner hole of large aperture drawing die has been developed successfully. Aiming at the problems of high wear rate and low material removal rate in tribochemical polishing, Based on the graphitization theory of diamond and according to the material requirement of tribochemical polishing, five new alloy polishing rods, such as MnCuNi, have been successfully prepared by mechanical alloying and hot pressing sintering technology in this paper. The microstructure and mechanical properties of the alloy were characterized and analyzed. (3) the tribochemical polishing test was carried out with the self-made alloy rod. The results showed that the removal rate of diamond and the wear rate of each alloy rod were different. The polishing performance of MnCuNi alloy rod is the best, the removal rate is 1.58 mg / h, and the lowest wear rate is 3.37 mg / min Mn-CuNi alloy rod and electroplated diamond polishing head. Tribochemical polishing is superior to mechanical polishing. (4) polishing experiments on large aperture CVD diamond coated drawing die face are carried out by means of rough polishing process. MnCuNi alloy polishing rod is used for rough polishing, and electroplated diamond polishing head is used for fine polishing. The results show that in a certain range of parameters, the removal rate of diamond coating increases with the increase of speed and pressure, but the surface roughness decreases first and then increases, that is, the optimum linear velocity and pressure exist. The surface roughness of diamond coating can reach 0.075 渭 m after polishing with the optimum polishing process (coarse polishing 0.5 h, fine polishing 1.5 h).
【学位授予单位】：南京航空航天大学
【学位级别】：硕士
【学位授予年份】：2017
【分类号】：TG580.692

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