微型异面针镀碳膜研究

发布时间：2018-05-13 19:02

本文选题：尖端效应 + 外场　；参考：《中国地质大学(北京)》2017年硕士论文

【摘要】：喷丝头微型冲孔针头在冲孔过程中容易磨损磨断,影响生产效率和效益。为了提高针头的使用寿命,本文以制备膜基结合性能高、耐磨性强、表面粗糙度低的碳膜为出发点,设计了两条技术路线:(1)采用先中频磁控溅射Ti N过渡层,再热丝化学气相沉积金刚石薄膜的两步法在微型高速钢针头上制备金刚石膜。(2)多弧离子镀制备DLC薄膜。此外,镀膜过程中外场的存在会在异面尖端产生尖端效应,影响基材本身和其上的薄膜。以探索沉积工艺参数对薄膜表面性能的影响为主线,探讨微型异面针头在外场产生的尖端效应的影响机理。结果表明:(1)不同N_2流量影响TiN过渡层的表面形貌、粗糙度和膜基结合力。当N_2流量为35 sccm的时候,TiN薄膜表面孔洞最少,粗糙度最低为16.3 nm,膜层最为均匀致密,膜基结合力最高为21.8 N。通过改变热丝-衬底距离来改变衬底温度,在镀有TiN过渡层的钢针上沉积金刚石薄膜。既有金刚石和石墨的生长,又有金刚石和石墨的氢等离子体刻蚀生长过程,这就形成了一个动态平衡的过程,控制金刚石薄膜的生长。衬底温度对金刚石的生长和表面形貌组织都有显著影响。(2)两步法制备金刚石薄膜中,电场和热场的存在,在微型异面尖端产生尖端效应影响基材和薄膜质量。磁控溅射中的清洗偏压超过700 V时,尖端受到很强的电场力,在力的作用下打歪尖端;HFCVD尖端效应的影响方式为使内部自由电荷在尖端位置的分子热运动加剧,额外增加了尖端温度,从而影响金刚石的形核和长大,导致尖端部位薄膜不均匀。(3)多弧离子镀和磁控溅射制备DLC薄膜中,偏压的不同影响DLC薄膜的表面形貌和粗糙度。适当提高基体偏压有助于减少薄膜表面液滴,提高膜层均匀性和致密度。现场冲孔实验发现多弧离子镀沉积的DLC镀膜针头在针头尺寸和表面光洁度方面不如磁控溅射沉积的DLC镀膜针头,在冲压性能稍优于磁控溅射沉积的DLC镀膜针头。
[Abstract]:The micro punching needle of the spinneret is easy to wear and break during punching, which affects the production efficiency and benefit. In order to improve the service life of the needle, two technical routes were designed to prepare carbon film with high binding property, high wear resistance and low surface roughness. The first intermediate frequency magnetron sputtering tin transition layer was designed. DLC thin films were prepared on micro high speed steel (HSS) needle by two step method of hot filament chemical vapor deposition (CVD). In addition, the presence of the external field in the coating process will produce a tip effect at the tip of the surface, which will affect the substrate itself and the film on the substrate. Based on the exploration of the influence of deposition process parameters on the surface properties of the thin film, the influence mechanism of the tip effect of the miniature dissimilar needle in the external field is discussed. The results show that the surface morphology, roughness and membrane adhesion of TiN transition layer are affected by different flow rate. When the flow rate of N-2 is 35 sccm, the surface pores of tin thin film are the least, the roughness is 16.3 nm, the film layer is uniform and compact, and the highest adhesion is 21.8 N. By changing the distance between hot wire and substrate to change the substrate temperature, diamond film was deposited on the needle coated with TiN transition layer. Both the growth of diamond and graphite and the growth process of diamond and graphite by hydrogen plasma etching have formed a dynamic equilibrium process to control the growth of diamond films. The substrate temperature has a significant effect on the growth and surface morphology of diamond films. When the cleaning bias voltage in magnetron sputtering exceeds 700V, the tip is subjected to a strong electric field force. The effect of the tip effect of HFCVD on the tip of the tip caused by the force is aggravated by the molecular thermal motion of the internal free charge at the tip. In addition, the tip temperature is increased, which affects the nucleation and growth of diamond, and leads to the inhomogeneity of the thin film at the top of the DLC film. The surface morphology and roughness of the DLC film are affected by the different bias voltage in the process of multi-arc ion plating and magnetron sputtering. Increasing the substrate bias can reduce the droplets on the surface of the film and improve the uniformity and density of the film. In situ punching experiments, it is found that the DLC coating needle deposited by multi-arc ion plating is inferior to the DLC film plating needle deposited by magnetron sputtering in terms of needle size and surface finish, and its stamping performance is slightly better than that of DLC film plating needle deposited by magnetron sputtering.
【学位授予单位】：中国地质大学(北京)
【学位级别】：硕士
【学位授予年份】：2017
【分类号】：TG174.4

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