哈氏合金电化学抛光工艺的研究

发布时间：2018-06-04 00:39

  本文选题：表面粗糙度 + 哈氏合金　； 参考：《材料导报》2017年02期

【摘要】：采用环保型抛光液对离子束辅助沉积技术路线用哈氏合金HastelloyC-276基带进行了电化学抛光,获得了典型的阳极极化曲线,并阐述了电化学抛光的机理。研究了影响电化学抛光的因素(电解液温度、抛光时间、抛光极距)对基带表面粗糙度的影响,优化工艺参数获得了表面粗糙度Ra5nm(5μm×5μm)的高质量表面,满足后续生长过渡层对哈氏合金基带的要求。抛光液中的柠檬酸在50℃左右分解成络合剂,可迅速沉淀金属离子,提高表面的活性。
[Abstract]:A typical anodic polarization curve was obtained by electrochemical polishing with HastelloyC-276 base band of Hardlich alloy for ion beam assisted deposition with environmentally friendly polishing liquid, and the mechanism of electrochemical polishing was described. The influence of factors affecting electrochemical polishing (electrolyte temperature, polishing time, polishing distance) on the surface roughness of baseband was studied. The surface roughness of Ra5nm(5 渭 m 脳 5 渭 m was obtained by optimizing the process parameters. Meet the requirements of the following growth transition layer for the base band of Hardlich alloy. The citric acid in the polishing liquid can be decomposed into a complexing agent at about 50 鈩，

本文编号：1975010