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基材温度对磁控溅射制备的Ti-Al-Si-Cu-N涂层的微观结构及摩擦学性能的影响(英文)

发布时间:2018-07-25 10:27
【摘要】:采用反应磁控溅射技术在304不锈钢基片上沉积Ti-Al-Si-Cu-N涂层。通过扫描电镜(SEM)、能谱仪(EDS)、X射线衍射仪(XRD)、纳米压痕仪、划痕仪和球盘式摩擦磨损试验机研究了不同基材温度(沉积温度)对涂层结构和摩擦学性能的影响。结果表明:随着沉积温度从室温升至250℃,涂层表面变得平滑,结构致密。硬度和弹性模量随沉积温度的升高而升高。划痕试验表明:当沉积温度分别为室温,150和250℃时,临界载荷为3.85,3.45和5.10 N。当沉积温度为250℃时,涂层的摩擦系数和磨损速率最小,摩擦过程中产生的磨屑主要来自GCr15不锈钢珠。在较低的沉积温度下,涂层的磨损机理主要为疲劳断裂和磨粒磨损,而250℃沉积的涂层的磨损机制主要为磨粒磨损。
[Abstract]:Ti-Al-Si-Cu-N coatings were deposited on 304 stainless steel substrates by reactive magnetron sputtering. The effects of substrate temperature (deposition temperature) on the structure and tribological properties of the coatings were investigated by scanning electron microscope (SEM),) energy spectrometer (SEM),) and (EDS) X-ray diffractometer (XRD),) nano-indentation instrument, scratch tester and ball disk friction and wear tester. The results show that with the deposition temperature rising from room temperature to 250 鈩,

本文编号:2143538

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