低温等离子复合技术制备氧化铝阻氚涂层（英文）
发布时间：2018-09-12 12:45
【摘要】：采用低温等离子复合技术,先后经过磁控溅射镀铝,热处理及氧离子注入,在不锈钢基体上制备了氧化铝阻氚涂层。利用XRD、SEM、EDS、AES对涂层进行了相结构、表面形貌、成分、氧元素分布等分析,并进行了划痕试验、抗热震及阻氚性能测试。结果表明:磁控溅射获得了高质量的铝涂层,热处理后形成了Fe Al合金过渡层。在氧离子注入中,当注入剂量不变电压增加时,离子注入深度增加,而氧元素分布梯度降低;当注入剂量达到8×10~(17) ions/cm~2以上时,氧元素分布变得均匀。所获得的氧化铝涂层具有较好膜/基结合力、抗热震性能及阻氚性能。经过叠加电压注入且剂量达到8×10~(17) ions/cm~2的膜层具有最好的阻氚性能,在600℃能使不锈钢的氚渗透率降低3个数量级。
[Abstract]:Aluminum oxide tritium resistance coating was prepared on stainless steel substrate by magnetron sputtering aluminizing heat treatment and oxygen ion implantation by low temperature plasma composite technology. The phase structure, surface morphology, composition and oxygen distribution of the coating were analyzed by XRD,SEM,EDS,AES. The scratch test, thermal shock resistance and tritium resistance performance were also carried out. The results show that high quality aluminum coating is obtained by magnetron sputtering and the transition layer of Fe Al alloy is formed after heat treatment. In oxygen ion implantation, the depth of ion implantation increases and the distribution gradient of oxygen element decreases when the implantation dose is constant, and when the implantation dose is above 8 脳 10 ~ (17) ions/cm~2, the distribution of oxygen element becomes uniform. The Al _ 2O _ 3 coating has good adhesion to film / substrate, thermal shock resistance and tritium resistance. After superposition voltage implantation and the dosage of 8 脳 10 ~ (17) ions/cm~2, the film has the best tritium resistance performance. At 600 鈩，
本文编号：2239042
[Abstract]:Aluminum oxide tritium resistance coating was prepared on stainless steel substrate by magnetron sputtering aluminizing heat treatment and oxygen ion implantation by low temperature plasma composite technology. The phase structure, surface morphology, composition and oxygen distribution of the coating were analyzed by XRD,SEM,EDS,AES. The scratch test, thermal shock resistance and tritium resistance performance were also carried out. The results show that high quality aluminum coating is obtained by magnetron sputtering and the transition layer of Fe Al alloy is formed after heat treatment. In oxygen ion implantation, the depth of ion implantation increases and the distribution gradient of oxygen element decreases when the implantation dose is constant, and when the implantation dose is above 8 脳 10 ~ (17) ions/cm~2, the distribution of oxygen element becomes uniform. The Al _ 2O _ 3 coating has good adhesion to film / substrate, thermal shock resistance and tritium resistance. After superposition voltage implantation and the dosage of 8 脳 10 ~ (17) ions/cm~2, the film has the best tritium resistance performance. At 600 鈩，
本文编号：2239042
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