模具自由曲面变轨迹抛光技术研究

发布时间：2018-12-15 10:55

【摘要】：针对模具自由曲面抛光效率低、磨粒抛光轨迹均匀性差的问题,提出一种变轨迹弹性抛光轮技术。介绍了弹性抛光轮工具的工作原理与机械结构设计,以Preston方程结合赫兹接触理论为指导,对抛光接触区内的压力分布、速度分布和磨粒抛光轨迹均匀性进行研究,建立抛光工具的材料去除模型。基于运动学模型,利用Matlab对弹性抛光轮工具在不同转速比下的抛光轨迹进行仿真,并根据均匀性评价标准对仿真结果进行对比分析。结果表明:转速比对磨粒抛光轨迹均匀性有重要影响,在下压量为0.5 mm、抛光接触圆直径为5 mm、公转3周时,转速比为10.645 751的CV值比转速比为10时降低了32%;当转速比趋于无理数时,抛光轨迹均匀性明显优于整数转速比,去除函数更加饱满。
[Abstract]:Aiming at the problems of low polishing efficiency and poor uniformity of abrasive polishing trajectory, a variable trajectory elastic polishing wheel technology is proposed. This paper introduces the working principle and mechanical structure design of the elastic polishing wheel tool. Under the guidance of Preston equation and Hertz contact theory, the pressure distribution, velocity distribution and abrasive polishing trajectory uniformity in the polishing contact region are studied. Build the material removal model of polishing tools. Based on kinematics model, Matlab was used to simulate the polishing trajectory of elastic polishing wheel tool under different rotational speed ratio, and the simulation results were compared and analyzed according to the evaluation standard of uniformity. The results show that the rotation speed ratio has an important effect on the uniformity of the abrasive polishing trajectory. When the pressure is 0.5 mm, the contact diameter of the polishing contact circle is 5 mm, revolution for 3 weeks, the specific rotational speed ratio of 10.645 mm, to 10.645 CV value is reduced by 32 parts at 10:00. When the rotational speed ratio tends to be irrational, the uniformity of the polishing trajectory is obviously better than the integer rotational speed ratio, and the removal function is more full.
【作者单位】：西安建筑科技大学机电工程学院;
【基金】：国家自然科学基金(51375361)
【分类号】：TG580.692;TG76

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