大行程纳米级定位工作台的结构设计

发布时间：2018-08-31 16:51

【摘要】：考虑采用静态三步拼接曝光法的扫描干涉场曝光系统的性能与工作台的定位精度及稳定性相关,设计了一种大行程、高精度二维工作台以提高其定位精度。采用摩擦驱动和压电陶瓷微位移机构组合的方式构成宏、微进给机构,由闭式气体静压导轨带动工作台实现沿X、Y两个方向的光栅分度与扫描运动。优化设计了摩擦驱动机构和气体静压导轨结构,并对工作台整体结构固有频率进行了有限元分析。使用自准直仪检测了导轨在X、Y方向的直线性,结果显示其两方向偏航和俯仰精度均在±0.04μm以内。使用激光干涉仪检测了导轨在X方向的定位精度和定位噪声,结果表明,对X向行程为220mm、Y向行程为300mm的工作台,其X方向的定位精度优于±5nm,定位稳定性可达±25nm。得到的结果满足扫描干涉场曝光系统工作台纳米级定位精度的要求。
[Abstract]:Considering that the performance of the scanning interference field exposure system using static three-step splicing exposure method is related to the positioning accuracy and stability of the worktable, a two-dimensional worktable with large stroke and high precision is designed to improve its positioning accuracy. The macro and micro feed mechanism is composed of friction drive and piezoelectric ceramic micro displacement mechanism. The closed gas hydrostatic guide rail drives the worktable to realize the grating indexing and scanning motion along the XY direction. The friction driving mechanism and the gas static guide rail structure are optimized and the natural frequency of the whole structure of the worktable is analyzed by finite element method. The alignment of the guide rail in the XY direction is measured by using the autocollimator. The results show that the yaw and pitch accuracy in both directions are within 卤0.04 渭 m. The laser interferometer is used to detect the orientation accuracy and noise of the guide rail in X direction. The results show that the positioning accuracy of X direction is better than 卤5 nm and the positioning stability is 卤25 nm for the worktable with the X direction travel of 220 mm / Y and 300mm. The results obtained meet the requirements of nanometer level positioning accuracy of the scanning interferometric exposure system.
【作者单位】：中国科学院长春光学精密机械与物理研究所;
【基金】：国家重大科学仪器设备开发专项资助项目(No.61227901)
【分类号】：TH122

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