直边衍射驻波场中铬原子三维沉积特性分析

发布时间：2018-01-06 13:05

本文关键词：直边衍射驻波场中铬原子三维沉积特性分析　出处：《光学学报》2017年06期 　论文类型：期刊论文

【摘要】：利用近共振激光驻波场操纵中性原子实现纳米级条纹沉积是一种新型的研制纳米结构长度标准传递方法。在会聚原子过程中,由于沉积基片的存在,激光驻波场内会产生直边衍射现象,从而影响原子的运动轨迹及沉积光栅。建立了直边衍射扰动下激光驻波场模型,通过四阶龙格-库塔法,对铬原子的三维运动轨迹及沉积效果进行仿真。考虑到激光功率与失谐量的影响,从半峰全宽(FWHM)和对比度入手,对铬原子运动轨迹及沉积条纹特性进行分析。结果表明,当激光功率为3.93mW,失谐量为200 MHz时,原子沉积光栅的FWHM为6.043nm,对比度为0.863,原子沉积光栅的质量最佳。与经典模型相比,该模型考虑了驻波场中直边衍射的影响,所得模拟结果更接近实际,对实验有理论指导意义。
[Abstract]:The use of near resonant laser standing wave field manipulation of neutral atoms realize nano stripe deposition is a new type of nano fabrication length standard transfer method. In the process of focused atomic deposition substrate, due to the existence of the laser standing wave will produce straight edge diffraction, thus affecting the trajectory and deposition of atoms. Straight edge diffraction grating disturbance under laser standing wave field model was established by the four order Runge Kutta method, the simulation of 3D motion trajectory and deposition effect of chromium atoms. Considering the influence of laser power and detuning, the full width at half maximum (FWHM) and the contrast of the chromium atom trajectory and sedimentary characteristics of stripe the analysis results showed that when the laser power is 3.93mW, the detuning is 200 MHz, the grating atom deposition FWHM is 6.043nm, the contrast is 0.863, the best quality of grating atomic deposition. Compared with the classical model, this model Considering the influence of standing wave field of straight edge diffraction, the simulation results are closer to the reality and theoretical guidance for the experiment.

【作者单位】：桂林电子科技大学电子工程与自动化学院;广西高校光电信息处理重点实验室;
【基金】：国家自然科学基金(61565004) 广西自然科学基金(2013GXNSFDA019002,2014GXNSFGA118003) 桂林市科学研究与技术开发课题(20140127-1,20150133-3)
【分类号】：TN249;TN25
【正文快照】： 0614004-1guidance to the experiment.纳米技术是目前研究广泛、发展迅速的一门科学技术,其目的是研究、发展和加工结构尺寸小于100nm的材料、装置和系统,以获得所需要的功能和性能[1]。在纳米计量过程中,受工作原理、测量环境等因素的影响,测量结果可能会截然不同。因此,研

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