熔石英元件HF刻蚀的实验研究

发布时间：2018-01-28 20:36

本文关键词： 光学制造熔石英化学刻蚀亚表层缺陷激光诱导损伤　出处：《强激光与粒子束》2017年11期 　论文类型：期刊论文

【摘要】：为深入了解熔石英元件化学刻蚀过程,研究了HF刻蚀反应机理、HF刻蚀工艺参数以及刻蚀对表面质量的影响规律。通过控制变量法,获得刻蚀速率随HF浓度、刻蚀温度以及NH4F浓度的变化规律。对刻蚀不同深度后的元件表面粗糙度、形貌、杂质含量以及激光损伤阈值进行了检测,实验结果表明:刻蚀速率受多种因素共同影响,其中HF浓度的促进作用最为显著;刻蚀后的熔石英表面形貌复杂,有横向、纵向、拖尾等形式的划痕,以及坑点、杂质等缺陷,其中横向划痕和纵向划痕占据了缺陷部分的主体,主要杂质铈元素随刻蚀时间的增长不断减少;激光损伤阈值测量实验表明,通过HF刻蚀将元件损伤阈值提高了59.6%。
[Abstract]:In order to understand the chemical etching process of fused quartz elements, the reaction mechanism of HF etching and the influence of etching parameters on surface quality were studied. The changes of etching rate with HF concentration, etching temperature and NH4F concentration were obtained. The surface roughness, morphology, impurity content and laser damage threshold were measured. The experimental results show that the etching rate is influenced by many factors, among which HF concentration is the most effective. The surface morphology of etched fused quartz is complex, including transverse, longitudinal, trailing and other forms of scratch, as well as holes, impurities and other defects, in which transverse and longitudinal scratches occupy the main part of the defect. The main impurity cerium decreases with the increase of etching time. The experimental results of laser damage threshold measurement show that the element damage threshold is increased 59.6 by HF etching.
【作者单位】：哈尔滨工业大学机电工程学院;
【基金】：科学挑战专题资助项目(JCKY2016212A506-0503) 国家自然科学基金项目(51475106) 中国工程物理研究院超精密加工技术重点实验室开放基金项目(KF14007)
【分类号】：TN24
【正文快照】： 在各类光学系统中,熔石英材料凭借其良好的特性得到广泛的应用,尤其在大型高功率激光器系统中,熔石英元件数量十分庞大,并且是多种关键部件的重要组成部分。然而,元件在研磨、抛光等机械加工过程中不可避免地会产生亚表层损伤(SSD),该亚表层损伤区域可部分或全部隐藏于抛光再

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