Evolution of plasma parameters in an Ar-N 2 /He inductive pl
发布时间：2023-09-29 00:49
Magnetic pole enhanced inductively coupled plasmas(MaPE-ICPs) are a promising source for plasma-based etching and have a wide range of material processing appUcations.In the present study Langmuir probe and optical emission spectroscopy were used to monitor the evolution of plasma parameters in a MaPE-ICP Ar-N2/He mixture plasma.Electron density(ne) and temperature(Te),excitation temperature(Texc),plasma potential(Vp),skin depth(δ) and the e...
【文章页数】：9 页
【文章目录】：
1. Introduction
2. Experimental details
3. Optical emission spectroscopy
4. Results and discussion
4.1. Electron density and temperature
4.2. Excitation temperature and emission intensity
4.3. Plasma potential and skin depth
4.4. Evolution of the EEPF profile
5. Conclusions
Acknowledgments
本文编号：3848954
【文章页数】：9 页
【文章目录】：
1. Introduction
2. Experimental details
3. Optical emission spectroscopy
4. Results and discussion
4.1. Electron density and temperature
4.2. Excitation temperature and emission intensity
4.3. Plasma potential and skin depth
4.4. Evolution of the EEPF profile
5. Conclusions
Acknowledgments
本文编号：3848954
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