TFT-LCD曝光工艺参数TP实验研究

发布时间：2018-10-31 16:48

【摘要】：从Total Pitch(TP)的理论含义与监控原理出发,通过对相同Device下Pitch量和TP测试Mark的更改,讨论了X方向以及Y方向TP的变化。通过相同Lay out不同产品和相同产品不同Lay out的对比,发现TP并不随着Pitch量的改变而变化,但设备扭曲度(Distortion)影响着TP的变化,由此TP也可称为Distortion在实际生产中的简化监测点,并且得到TP从NG到OK变化的pitch量区间,这也为降低图形在基板上的扭曲程度和优化Mask设计提供了新思路。
[Abstract]:Based on the theoretical meaning and monitoring principle of Total Pitch (TP), the changes of X direction and Y direction TP are discussed by changing the Pitch quantity and TP test Mark under the same Device. By comparing different products of the same Lay out and different Lay out of the same product, it is found that the TP does not change with the change of the amount of Pitch, but the (Distortion) of the equipment twist affects the change of TP, so TP can also be called the simplified monitoring point of Distortion in actual production. The pitch range of TP from NG to OK is obtained, which provides a new way to reduce the distortion of graphics on the substrate and to optimize the Mask design.
【作者单位】： 成都京东方光电科技有限公司;
【分类号】：TN873.93

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