极紫外多层膜膜厚梯度控制及抗热损伤研究

发布时间：2018-01-10 15:10

  本文关键词：极紫外多层膜膜厚梯度控制及抗热损伤研究　出处：《中国科学院研究生院(长春光学精密机械与物理研究所)》2016年博士论文　论文类型：学位论文

  更多相关文章： 极紫外多层膜 膜厚横向梯度 纵向梯度多层膜 抗热损伤 磁控溅射

【摘要】：极紫外多层膜反射镜是极紫外光刻系统的核心光学元件,极紫外光刻系统对多层膜的性能有着极其苛刻的要求,包括高反射、低应力、高均匀性及抗损伤。本文围绕后两个问题开展了以下研究:1.针对极紫外多层膜反射镜入射角-波长匹配和面形误差控制需求,开展了极紫外多层膜膜厚横向梯度控制研究。采用遗传算法拟合平面基底在若干个不同高度下匀速扫过靶下方得到的膜厚分布曲线来反算磁控溅射源特性分布,在此基础上,同样采用遗传算法反演对应于目标膜厚横向梯度分布的基底速度曲线。通过上述方法实现了曲面基底上极紫外多层膜膜厚横向梯度的高精度控制。2.针对极紫外光刻原理试验装置照明系统小尺寸反射镜大入射角带宽的需求,开展了极紫外多层膜膜厚纵向梯度控制研究。采用有效厚度法来处理Mo/Si多层膜层间扩散对宽带多层膜光谱性能的影响。首先,标定了Mo/Si多层膜膜层有效厚度与公转速度关系式;然后,采用Levenberg-Marquardt算法完成宽带膜系设计;最后,将设计膜系在磁控溅射镀膜机上进行制备,并对其极紫外反射谱进行测量,实验结果与设计结果吻合得很好。3.针对极紫外光源收集镜在高温环境下使用的需求,开展了极紫外多层膜抗热损伤初步研究。通过在Mo/Si多层膜膜层间插入BN阻挡层得到了抗热损伤性能优异的Mo/BN/Si/BN多层膜,X射线衍射仪和高分辨透射电镜表征结果表明该多层膜能够承受500℃高温。上述研究为满足极紫外光刻系统使用需求的高性能极紫外多层膜研制提供了理论依据和技术支撑,为后续面向商业化运行的极紫外光刻系统多层膜光学元件研制奠定了技术基础。
[Abstract]:The ultra-ultraviolet multilayer mirror is the core optical element of the ultra-ultraviolet lithography system. The ultra-ultraviolet lithography system has very harsh requirements for the performance of the multilayer film, including high reflection and low stress. In this paper, the following research is carried out around the last two problems: 1. Aiming at the requirement of incident angle-wavelength matching and surface error control of ultra-ultraviolet multilayer mirror. The transverse gradient control of ultra-ultraviolet multilayer film thickness was carried out. Genetic algorithm was used to fit the film thickness distribution curve of planar substrate swept through the target at different heights at uniform speed to calculate the characteristic distribution of magnetron sputtering source. On that basis. The velocity curve of the substrate corresponding to the transverse gradient distribution of the target film thickness is also retrieved by genetic algorithm. By using the above method, the high precision control of the transverse gradient of the extreme ultraviolet multilayer film thickness on the surface substrate is realized. 2. External lithography principle Test device small size reflector large incidence angle bandwidth requirements for lighting system. The effect of Mo/Si multilayer diffusion on the spectral performance of broadband multilayer films was studied by using effective thickness method. The relationship between the effective thickness of Mo/Si multilayer film and the rotation velocity is calibrated. Then, Levenberg-Marquardt algorithm is used to complete the design of wideband film system. Finally, the designed film was prepared on the magnetron sputtering coating machine, and its extreme ultraviolet reflectance spectrum was measured. The experimental results are in good agreement with the design results. 3. Aiming at the requirement of the ultra-ultraviolet light source collecting mirror used in high temperature environment. The thermal damage resistance of Mo/Si multilayer films was studied preliminarily. Mo/BN/Si/BN multilayers with excellent thermal damage resistance were obtained by inserting BN barrier layer between the layers of Mo/BN/Si/BN multilayers. The results of X-ray diffractometer and high resolution transmission electron microscopy show that the multilayer film can withstand 500 鈩，

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