新型投射式电容触摸屏关键问题的研究
本文关键词: 电容触摸屏 纳米银 导电微网格 边缘强化 透明导电膜 出处:《华南理工大学》2015年博士论文 论文类型:学位论文
【摘要】:近几年,随着iphone系列新型电子产品的不断强势推出,其所采用的投射式电容触摸屏也成为了智能手机、平板电脑等电子产品的最主要输入工具及标配装置,极大地推动人机界面电容触控技术的发展。同时,对触摸屏在轻薄化、大尺寸化、高灵敏度、坚固化等方面的要求也越来越高。把触控感应层和玻璃盖板整合为一体的整合式新型投射式电容触摸屏是产业界的一个研究热点。针对整合式大尺寸电容触摸屏灵敏度问题,对多种透明导电膜材料的分析对比,在玻璃基板上直接采用凹槽填充式的纳米金属导电微网格来制备高导电率和高透过率的透明导电膜,可较大提高触摸灵敏度及光透过率。同时,通过优化纳米/微米银浆的配比,分别采用蚀刻法、压印法和显影法在玻璃基板上直接制作了纳米金属导电微网格,得到优化的工艺方法。实验结果表明:显影法能够在玻璃基板上形成良好的网状凹槽,再通过填充适当的纳米/微米颗粒银浆,可获得高导电性与高透光率的微网格。进一步在微网格上加入黑色层和平坦层,将其制作为双层结构,并在网格上采用抗摩尔纹的倾斜设计和无序设计,可提高纳米金属导电微网格与整合式结构电容触摸屏的兼容性。论文针对整合型电容触摸屏的坚固性问题,进行触摸屏的边缘强化研究。采用氟化铵代替氢氟酸作为主要的强化蚀刻药液成分,研究开发了一个采用非氢氟酸盐溶液实现触摸屏边缘抛光的强化新工艺。通过对抛光样品进行4PB弯曲强度的测试表明,新工艺可明显地改善触摸屏的边缘强度,同时避免了边缘抛光过程对触控感应层的破坏,有效地提高整合型电容触摸屏的坚固性及产品的可靠性。综合上述纳米金属导电微网格的制作方法及边缘强化的新工艺,研制作了相应的电容触摸屏,结果表明:所制作的触摸屏能够实现高灵敏度触控功能,具有较高的坚固性,其透射率高于91.8%,反射率低于5.5%,且不产生电极反射光,在强光环境具有良好的可读性。
[Abstract]:In recent years, with the introduction of the new iphone series of electronic products, its projective capacitive touch screen has become a smart phone. The most important input tools and standard devices of electronic products such as tablet computer greatly promote the development of man-machine interface capacitive touch technology. At the same time, the touch screen is thin, large size and high sensitivity. The new integrated projective capacitive touch screen which integrates the touch sensing layer and the glass cover plate is a research hotspot in the industry. The integrated large size capacitive touch screen is a hot spot in the industry. Sensitivity. Through the analysis and comparison of various transparent conductive film materials, the transparent conductive film with high conductivity and high transmittance was prepared directly on the glass substrate using groove-filled nanometallic conductive microgrids. At the same time, by optimizing the ratio of nano / micron silver paste, the nano metal conductive microgrids were fabricated on glass substrate by etching, imprint and development respectively. The experimental results show that the development method can form a good mesh groove on the glass substrate and then fill the appropriate nano / micron silver paste. The black layer and flat layer are added to the microgrid to make it into a double-layer structure, and the anti-mollification tilting design and disordered design are adopted on the grid. It can improve the compatibility between nano-metal conductive microgrid and integrated capacitive touch screen. Using ammonium fluoride instead of hydrofluoric acid as the main composition of enhanced etching solution. A new strengthening process for edge polishing of touch screen using non-hydrofluorate solution was developed. The bending strength of the polished sample was measured by 4PB. The new process can obviously improve the edge strength of the touch screen and avoid the damage of the touch sensing layer caused by the edge polishing process. The robustness of the integrated capacitive touch screen and the reliability of the product are improved effectively. The corresponding capacitive touch screen is developed by synthesizing the fabrication method of the nano-metal conductive microgrid and the new technology of edge strengthening. The results show that the touch screen can achieve high sensitivity touch control function, has a high robustness, its transmittance is higher than 91.8, the reflectivity is lower than 5.5, and the electrode does not reflect light. In strong light environment has good readability.
【学位授予单位】:华南理工大学
【学位级别】:博士
【学位授予年份】:2015
【分类号】:TN873
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