电化学共沉积氧化锌-氧化铜薄膜法显现潜指纹

发布时间：2018-11-11 15:00

【摘要】：发展了一种新的电化学共沉积氧化锌-氧化铜薄膜法来显现多种导电基底(不锈钢片、铝片、铜片、锌片、5角和1元的硬币)上的潜指纹的方法。该方法的原理是基于导电基底上潜指纹的嵴线区残留物具有电化学惰性,电化学共沉积反应选择性地发生在潜指纹的谷线区和没有潜指纹覆盖的导电基底上,这一过程导致基底上潜指纹的嵴线区和谷线区之间产生显著的颜色差异,最后得到具有较高对比度的潜指纹反像。从场发射电子扫描电镜图像和元素分析的结果确认,氧化锌-氧化铜薄膜主要沉积到了潜指纹的谷线区,而嵴线区上的沉积物较少。通过氧化锌-氧化铜薄膜的共沉积,导电基底上的潜指纹显现图像能够提供清晰的二级水平信息和部分三级水平信息。该方法具有操作简便、显现效率高、适用客体广的特点,是一种具有很好的实际应用前景的潜指纹显现方法。
[Abstract]:A new electrochemical co-deposition method of zinc oxide and copper oxide thin films has been developed to show latent fingerprints on a variety of conductive substrates (stainless steel, aluminum, copper, zinc, 5 jiao and 1 dollar coins). The principle of this method is based on the electrochemical inertia of the ridge residue of the latent fingerprint on the conductive substrate, and the electrochemical codeposition reaction occurs selectively in the valley of the latent fingerprint and on the conducting substrate without the latent fingerprint. This process leads to a significant color difference between the ridge area and the valley line area of the underlying fingerprint on the substrate. Finally, the inverse image of the latent fingerprint with high contrast is obtained. The results of field emission electron scanning electron microscopy (SEM) and elemental analysis show that zinc oxide and copper oxide films are mainly deposited in the valley of latent fingerprint, but there are less deposits on the ridge. By co-deposition of zinc oxide and copper oxide films, the latent fingerprint images on conductive substrates can provide clear secondary level information and partial tertiary level information. This method has the characteristics of simple operation, high efficiency and wide application object. It is a kind of latent fingerprint display method with good application prospect.
【作者单位】：北京科技大学化学与生物工程学院生物工程与传感技术研究中心;
【基金】：国家自然科学基金项目(21005006,21127007) 中央高校基本科研基金项目(06199019)资助
【分类号】：O646;D918.91

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