基于约束刻蚀原理的电化学微纳加工研究进展

发布时间：2018-10-30 13:28

【摘要】：与机械加工相比,电化学加工技术具有无刀具磨损、无热效应、无机械损伤、加工效率高等优点,而且适用于柔性、脆性及超硬材料,具备传统方法难以实现的复杂结构加工能力,因而在航空航天、汽车、微电子等领域有着重要应用,日益成为一种重要的工业制造技术.随着超大规模集成电路(ULSI)、微机电系统(MEMS)、微全分析系统(μ-TAS)、现代精密光学系统等高技术产业的迅速发展,功能性结构/器件的微型化和集成化的要求越来越高.由于传统电化学只适用于金属材料,为了应对微纳制造的时代要求,拓展电化学加工的材料普适性,1992年田昭武院士提出了具有我国自主知识产权的约束刻蚀剂层技术(CELT).一般的,约束刻蚀包括3个步骤:(1)通过电化学、光化学或光电化学的方法在模板电极表面生成刻蚀剂;(2)通过后续的均相化学反应或自由基衰变反应将刻蚀剂约束在微/纳米厚度的液层内;(3)将模板电极逼近加工基底,当约束刻蚀剂层接触被加工基底时,通过刻蚀反应实现微纳加工.最近,联合课题组通过仪器、原理和方法3个方面的努力,引入外部物理场调制技术,实现一维铣削、二维抛光、三维微/纳结构加工,大幅提升了CELT的技术水平.
[Abstract]:Compared with machining, electrochemical machining has the advantages of no tool wear, no heat effect, no mechanical damage, high machining efficiency, and is suitable for flexible, brittle and superhard materials. With the complex structure processing ability which is difficult to be realized by traditional methods, it has important applications in the fields of aerospace, automobile, microelectronics and so on, and has become an important industrial manufacturing technology day by day. With the rapid development of (MEMS), microanalysis system (渭-TAS), modern precision optical system) and other high-tech industries, very large scale integrated circuit (VLSI) (ULSI), microelectromechanical system, The miniaturization and integration of functional structures / devices are becoming more and more important. Because traditional electrochemistry is only suitable for metal materials, in order to meet the requirements of micro-nano fabrication and expand the universality of electrochemical processing materials, Academician Tian Zhaowu proposed the restrictive etchant layer technology (CELT).) with independent intellectual property rights in China in 1992. In general, constrained etching consists of three steps: (1) etching agents are generated on the surface of the template electrode by electrochemical, photochemical or photochemical methods; (2) the etchant is confined in the liquid layer of micro- / nano-thickness by the subsequent homogeneous chemical reaction or free radical decay reaction; (3) the template electrode is approximated to the substrate, and when the constrained etchant layer is in contact with the machined substrate, the micro-nano machining is realized by etching reaction. Recently, through the efforts of instruments, principles and methods, the joint research group introduced the external physical field modulation technology to realize one-dimensional milling, two-dimensional polishing and three-dimensional micro-/ nano-structure machining, which greatly improved the technical level of CELT.
【作者单位】：固体表面物理化学国家重点实验室能源材料化学协同创新中心厦门大学化学化工学院化学系;哈尔滨工业大学精密工程研究所;
【基金】：国家自然科学基金(编号:21573054,91323303,21321062) 机械制造系统工程国家重点实验室开放课题资助项目
【分类号】：TG662

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