集成电路布图设计法律保护研究

发布时间:2019-06-01 17:36
【摘要】:集成电路技术作为现在发展最快和最富有活力的技术领域之一,已成为信息产业的基础。知识产权对集成电路的保护是其得以不断发展的动力,一些发达国家如美国、日本和欧盟等都对集成电路知识产权做出了立法保护。放眼当下,研发更先进的集成电路已成为各国厂家关注的焦点,完善对集成电路布图设计的法律保护也成为各国政府所关注的重点课题。在这样的大形势下,我国为了经济发展和加入世贸组织的需要,对知识产权保护问题的重视程度也不断提升,这促进了我国知识产权立法制度的完善,于是对集成电路布图设计的专门立法便在此背景下得以产生。为了使集成电路布图设计的专有权得到有效保护,以鼓励集成电路产业进行技术的不断创新。2001年3月28日,国务院在第36次常务会议上通过了《集成电路布图设计保护条例》,并于2001年10月1日起实施;几乎与此同时,2001年9月18日,国家知识产权局公布了《集成电路布图设计条例实施细则》,并在2001年10月1日起予以施行。目前我国就是通过以上这两个法律文件对集成电路布图设计进行专门的立法保护。然而经过十多年的司法实践,《集成电路布图设计保护条例》中所存在的问题也逐渐显现出来。基于我国的集成电路布图设计法律保护中存在的问题,有待通过立法完善加以解决。本文以集成电路布图设计法律保护研究为题,应用比较分析的手法,分别从理论与实践两个方面对目前集成电路布图设计的立法现状、保护模式和完善建议等方面进行研究。具体而言,本文的逻辑思路和行文结构如下: 本文首先描述了集成电路布图设计的一般特征,并结合司法实践,对运用著作权、专利权或相关商业秘密保护布图设计时存在困难的状况加以论述,试图说明传统的知识产权保护手段难以对集成电路布图设计加以有效保护,以及对集成电路布图设计专门立法保护的必要。 其次,本文通过对集成电路布图设计保护的比较法考察,重点介绍了美国、日本和欧盟对集成电路布图设计的法律保护。运用比较分析的方法,总结了美国、日本和欧盟对集成电路布图设计法律保护的不同,分析了其中的利与弊。 再次,,通过对我国集成电路布图设计保护现状的详细描述,结合对集成电路布图设计侵权纠纷典型案例的仔细分析,指出我国集成电路布图设计保护存在的问题。 最后,通过对司法实践中所产生问题的深入研究,对我国集成电路布图设计保护的立法提出完善建议。着重阐述了《集成电路布图设计保护条例》规定过于概括,定性多而定量少的问题,在此基础上建议分别从程序法和实体法两个方面进行完善。同时,建议提高我国集成电路布图设计立法的位阶层次。
[Abstract]:Integrated circuit technology, as one of the fastest developing and most dynamic technical fields, has become the foundation of information industry. The protection of intellectual property rights to integrated circuits is the driving force of its continuous development. Some developed countries, such as the United States, Japan and the European Union, have made legislative protection of integrated circuit intellectual property rights. At present, the research and development of more advanced integrated circuits has become the focus of attention of manufacturers all over the world, and improving the legal protection of integrated circuit layout design has become the focus of attention of governments all over the world. Under such a situation, for the sake of economic development and the need of China's accession to the WTO, China has paid more and more attention to the protection of intellectual property rights, which has promoted the improvement of China's intellectual property legislation system. As a result, the special legislation on the layout design of integrated circuits can be produced in this context. In order to effectively protect the exclusive right of integrated circuit layout design to encourage continuous technological innovation in the integrated circuit industry. 28 March 2001, At the 36th standing meeting, the State Council adopted the regulations on the Protection of Integrated Circuit layout Design, which came into effect on October 1, 2001. Almost at the same time, on September 18, 2001, the State intellectual property Office issued the detailed rules for the implementation of the regulations on layout Design of Integrated Circuits, which came into effect on October 1, 2001. At present, our country is through the above two legal documents to carry on the special legislative protection to the integrated circuit layout design. However, after more than ten years of judicial practice, the problems existing in the regulations on layout Design and Protection of Integrated Circuits have gradually emerged. The problems existing in the legal protection of integrated circuit layout design in China need to be solved by legislative improvement. Based on the research of legal protection of integrated circuit layout design, this paper studies the legislative status, protection mode and improvement suggestions of integrated circuit layout design from two aspects of theory and practice by means of comparative analysis. Specifically, the logical thinking and structure of this paper are as follows: first of all, this paper describes the general characteristics of integrated circuit layout design, and combined with judicial practice, to the use of copyright, This paper discusses the difficult situation in the layout design of patent right or related trade secret protection, and tries to explain that the traditional intellectual property protection means are difficult to effectively protect the layout design of integrated circuits. And the need for special legislative protection of integrated circuit layout design. Secondly, through the comparative study of integrated circuit layout design protection, this paper focuses on the legal protection of integrated circuit layout design in the United States, Japan and the European Union. By using the method of comparative analysis, this paper summarizes the differences in the legal protection of integrated circuit layout design between the United States, Japan and the European Union, and analyzes the advantages and disadvantages of the legal protection of integrated circuit layout design in the United States, Japan and the European Union. Thirdly, through the detailed description of the present situation of integrated circuit layout design protection in China, combined with the careful analysis of typical cases of integrated circuit layout design infringement disputes, this paper points out the existing problems of integrated circuit layout design protection in China. Finally, through the in-depth study of the problems in judicial practice, this paper puts forward some suggestions on the legislation of layout design and protection of integrated circuits in our country. This paper focuses on the problems of excessive generalization, more qualitative and less quantitative provisions in the regulations on layout Design and Protection of Integrated Circuits, and on this basis, it is suggested that the regulations should be perfected from two aspects: procedural law and substantive law. At the same time, it is suggested that the level of integrated circuit layout design legislation should be improved.
【学位授予单位】:吉林大学
【学位级别】:硕士
【学位授予年份】:2013
【分类号】:D923

【参考文献】

相关期刊论文 前6条

1 刘文;集成电路布图设计的知识产权性质和特点[J];法商研究(中南政法学院学报);2001年05期

2 张耀明;中国知识产权保护的新视点──《集成电路布图设计保护条例》立法简介[J];科技与法律;2001年02期

3 方诗龙;集成电路布图设计权的法律保护[J];科技与法律;2002年03期

4 李明德;美国《半导体芯片保护法》研究[J];科技与法律;2004年03期

5 于春辉;欧宏伟;;审理侵犯集成电路布图设计专有权纠纷案件若干问题研究——天微公司诉明微公司侵犯集成电路布图设计专有权纠纷案评析[J];科技与法律;2010年06期

6 郭禾;半导体集成电路知识产权的法律保护[J];中国人民大学学报;2004年01期

相关硕士学位论文 前2条

1 金结斌;从中外法律比较看我国集成电路知识产权的法律保护[D];苏州大学;2006年

2 骆素芳;集成电路布图设计专有权撤销程序的探讨[D];中国政法大学;2007年



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