知识产权限制对中国制造技术追赶的影响研究

发布时间：2018-02-24 13:17

  本文关键词： 技术追赶 技术研发基础 研发投入渠道 专利制约　出处：《经济问题探索》2017年06期 　论文类型：期刊论文

【摘要】：探究技术未来发展趋势及其影响因素是深入理解后发国家技术赶超的基础。本文利用制造技术领域的技术预测问卷调查数据,实证研究知识产权限制如何影响我国技术未来发展格局变化。研究结果表明:技术受到专利制约不利于实现技术赶超;技术研发基础则对我国技术追赶产生了显著的正向影响效应,而且与专利制约联合影响下,正向影响非常明显。进一步的分析指出,技术追赶受到专利制约的影响呈现U型关系,专利制约超过拐点后将会对技术追赶呈显著正向影响。本文为理解后发国家未来技术发展格局变化、实现技术赶超提供了新的视角,对更好认识技术能力积累、辩证理解国际技术竞争也具有一定启发意义。
[Abstract]:Exploring the future development trend of technology and its influencing factors is the basis of understanding the technological catch-up of the latecomer countries. This paper makes use of the survey data of technology prediction in the field of manufacturing technology. Empirical study on how intellectual property restrictions affect the future development pattern of technology in China. The results show that: technology is restricted by patent is not conducive to the realization of technological catch-up; The foundation of technology research and development has a significant positive effect on technological catch-up in China, and the positive effect is very obvious under the joint influence of patent restriction. Further analysis points out that. Technological catch-up is influenced by patent restriction, which is U-shaped. Patent restriction beyond the inflection point will have a significant positive impact on technological catch-up. This paper aims to understand the future technological development pattern changes in latecomer countries. The realization of technological catching up provides a new angle of view, which is also instructive to better understand the accumulation of technological ability and dialectical understanding of international technological competition.
【作者单位】： 中国科学技术发展战略研究院;南开大学经济与社会发展研究院;
【基金】：国家科技部创新战略研究专项“技术预测前沿理论、方法及应用”(ZLY2015126),项目负责人:袁立科 北京市科技创新中心建设战略研究及专家咨询专项“重点科技领域前沿热点跟踪及预测研究”(Z171100003217028),项目负责人:袁立科
【分类号】：F424.3
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本文编号：1530369