磁控溅射Al-Fe-Sn薄膜的电输运性能（英文）

发布时间：2017-12-27 21:49

本文关键词：磁控溅射Al-Fe-Sn薄膜的电输运性能（英文）　出处：《稀有金属材料与工程》2016年05期 　论文类型：期刊论文

【摘要】：在电子工业中,为了制备低电阻率的Al合金薄膜,需要对薄膜进行退火。虽然材料的电阻率与其电输运性能密切相关,然而到目前为止,对于铝合金薄膜的电输运性能研究甚少。本实验首先利用TEM对于磁控溅射铝合金薄膜的结构,特别是对其与基底界面处的结构进行了表征。在此基础上,利用霍尔效应测试了解界面状态的变化对于霍尔载流子浓度及迁移率的影响。结果表明,在退火过程中,薄膜与基底之间通过扩散形成紧密接触,从而使得合金薄膜同时具有较高的载流子浓度以及载流子迁移率。最后,利用一个新提出的能带模型,解释所观察到的界面变化对于电导率的影响。
[Abstract]:In order to prepare the low resistivity Al alloy film in the electronics industry, the film needs to be annealed. Although the resistivity of the material is closely related to its electrical transport properties, so far, the electrical transport properties of the aluminum alloy thin film are seldom studied. In this experiment, the structure of the magnetron sputtering aluminum alloy film was first used to characterize the structure of the magnetron sputtering aluminum alloy film, especially the structure at the interface between the TEM and the substrate. On this basis, the Holzer effect test was used to understand the influence of the change of the interface state on the carrier concentration and mobility of Holzer. The results show that during annealing process, thin film and substrate are formed by tight diffusion, which leads to higher carrier concentration and carrier mobility at the same time. Finally, a new proposed energy band model is used to explain the effect of the observed interface changes on the conductivity.
【作者单位】：同济大学;
【分类号】：TG146.21;TB383.2
【正文快照】： Al and Al alloy films with high characteristics are still nowthe major conductive materials in practical applications formany kinds of electrical equipments and power systems.Therepresentative Al films as wires have been widely used forVLSI(very large sc

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