金属网栅透明导电膜导电性能的研究

发布时间：2018-02-20 05:32

本文关键词： 金属网栅四探针法方阻屏蔽效率　出处：《哈尔滨工业大学》2017年硕士论文　论文类型：学位论文

【摘要】：随着人们对电磁波本质和特性认识的不断深入,越来越多的电子设备等得到了广泛应用,使得空间电磁环境日益复杂,一方面体现为电磁波强度大幅增加,另一方面体现为电磁波应用波段展宽,相应的,电磁屏蔽越来越引起人们的重视。电磁屏蔽技术中的一个难点和热点问题是对光学透明元件的电磁屏蔽,可采用金属网栅结构来解决。然而目前,关于金属网栅的研究大都集中在网栅的透过率和屏蔽效率的矛盾调和以及高级次衍射能量控制等方面,对表征金属网栅导电性能的重要参数即网栅方阻,还未有较系统深入的研究工作。本课题将针对金属网栅方阻这一重要参数展开理论分析与实验研究工作,主要研究内容如下:本课题首先探讨了网栅方阻测量时探针接触不良和探针游移的问题,通过引入毫米尺寸的中介电极来克服方阻测量时探针与金属网栅表面不可靠接触的问题,进而在不同的中介电极布置条件下,对多种四探针法进行金属网栅方阻测量的原理分析和实验方案设计,包括常规四探针法、双电测四探针法、方形四探针法、范德堡法、Rymazewski法、改进的范德堡法、改进的Rymazewski法;同时,为了对上述四探针法进行有效性验证,提出了适合方格金属网栅方阻分析的等效电阻法,将方格网栅在每个周期内的栅线等效为电阻,然后利用基尔霍夫定律,推导了方阻测量公式,并设计了测量方案。其次,基于等效电阻法,研究了网栅方阻随网栅线宽和周期的变化规律,网栅的多栅线交叉结构使得每一种结构的网栅都有其特有的方阻值,网栅栅线线宽和周期的变化同样也影响着网栅的方阻,研究网栅方阻随网栅结构参数的变化规律有助于网栅在设计时获得期望的方阻值;论文还研究了网栅方阻与屏蔽效率的关系,结果表明网栅方阻和屏蔽效率在网栅结构参数上具有相一致的优化方向。最后,同时考虑多种四探针法、多种网栅结构参数的方块形中介电极布置方式,以及同时考虑多种网栅结构参数的等效电阻法长条形中介电极布置方式,设计了集成化四探针法掩膜方案和集成化等效电阻法掩膜方案,用紫外光刻法制作了对应两种集成掩膜的金属网栅。根据设计的测量方案进行网栅方阻测量,实验结果表明,方阻测量结果中最大标准不确定度为u=0.42Ω/□。与等效电阻法相对比,双电测法B、C模式、范德堡法和改进的范德堡法在测量金属网栅方阻时比其它四探针法精度更高;而且双电测法B、C模式受探针间距的影响不大,范德堡法和改进的范德堡法的中介电极位于网栅边缘,都较适合实际金属网栅方阻的测量。
[Abstract]:With the deepening of people's understanding of the nature and characteristics of electromagnetic waves, more and more electronic devices have been widely used, which makes the electromagnetic environment of space increasingly complex. On the one hand, the intensity of electromagnetic waves increases significantly. On the other hand, it is reflected in the broadening of the band of electromagnetic wave application. Accordingly, electromagnetic shielding has attracted more and more attention. A difficult and hot problem in electromagnetic shielding technology is the electromagnetic shielding of optical transparent elements. The metal grid structure can be used to solve the problem. However, at present, the researches on metal grid mostly focus on the contradiction between the transmission efficiency and shielding efficiency of the grid and the control of the advanced secondary diffraction energy, etc. There is no systematic and deep research work on the important parameter that characterizes the electrical conductivity of metal mesh gate, that is, grid square resistance. In this paper, the theoretical analysis and experimental research on the important parameter of metal grid square resistance are carried out. The main research contents are as follows: firstly, the problems of poor probe contact and probe drift in the measurement of grid square resistance are discussed. An intermediate electrode of millimeter size is introduced to overcome the problem of unreliable contact between the probe and the metal grid surface in the measurement of square resistance, and then under different conditions of intermediate electrode arrangement, The principle analysis and experimental scheme design of metal grid square resistance measurement for various four-probe methods, including conventional four-probe method, double-electric four-probe method, square four-probe method, Vandberg method Rymazewski method, improved Vanderberg method and improved Rymazewski method, are presented. At the same time, in order to verify the validity of the four-probe method mentioned above, an equivalent resistance method suitable for grid grid resistance analysis is proposed. The grid line of grid grid in each cycle is equivalent to resistance, and then the Kirchhoff law is used. The formula of square resistance measurement is derived, and the measuring scheme is designed. Secondly, based on the equivalent resistance method, the variation of square resistance with the width and period of grid gate is studied. The multi-grid cross structure of grid makes each kind of grid has its own square resistance. The variation of grid width and period also affects the square resistance of grid. The study of the variation of grid square resistance with grid structure parameters will help to obtain the desired square resistance in the design of grid, and the relationship between grid square resistance and shielding efficiency is also studied in this paper. The results show that the square resistance and the shielding efficiency of the grid grid have the same optimization direction in the grid structure parameters. Finally, considering the various four-probe method and the square intermediate electrode arrangement mode of various grid structure parameters, the results show that the grid grid square resistance and the shielding efficiency have the same optimization direction on the grid grid structure parameters. At the same time, the integrated four-probe mask scheme and the integrated equivalent resistance mask scheme are designed by considering the equivalent resistance method with multiple grid structure parameters. The metal grid corresponding to two kinds of integrated masks was fabricated by UV lithography. The square resistance of the grid was measured according to the designed measurement scheme. The experimental results show that the maximum standard uncertainty in the square resistance measurement is 0.42 惟 / -, which is compared with the equivalent resistance method. The accuracy of the double electric measurement method, the Vandberg method and the improved Vanderberg method in measuring the square resistance of the metal grid is higher than that of the other four probe methods, and the double electric measurement method has little effect on the distance between the probes. The intermediate electrodes of the Vanderbilt method and the improved Vanderberg method are located at the edge of the grid, which are more suitable for the measurement of the square resistance of the metal grid.
【学位授予单位】：哈尔滨工业大学
【学位级别】：硕士
【学位授予年份】：2017
【分类号】：O441;TB383.2

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